PROCESS AND COMPOSITION OF MAKING POLYMERIZABLE RESINS CONTAINING OXAZOLIDONE
申请人:JIN XIAOMING
公开号:US20130184467A1
公开(公告)日:2013-07-18
Disclosed herein are a process and composition to make polymerizable resins containing oxazolidone, in which organic acid-catalyzed and/or thermal annealing process got involved and consequently promoted a unique intramolecular transformation from a linear urethane linkage to a cyclic urethane linkage for those specifically constructed urethane resins containing α-substituted β-ketone moieties.
CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND
申请人:OSAKA UNIVERSITY
公开号:US20170052449A1
公开(公告)日:2017-02-23
A pattern-forming method comprises patternwise exposing a predetermined region of a resist material film made from a photosensitive resin composition comprising a chemically amplified resist material to a first radioactive ray that is ionizing radiation or nonionizing radiation having a wavelength of no greater than 400 nm. The resist material film patternwise exposed is floodwise exposed to a second radioactive ray that is nonionizing radiation having a wavelength greater than the wavelength of the nonionizing radiation for the patternwise exposing and greater than 200 nm. The chemically amplified resist material comprises a base component, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The generative component comprises a radiation-sensitive sensitizer generating agent. The radiation-sensitive sensitizer generating agent comprises a compound represented by formula (A).