Säurehärtbare Zusammensetzung enthaltend einen maskierten Härtungskatalysator und Verfahren zu deren Härtung
申请人:CIBA-GEIGY AG
公开号:EP0084515A2
公开(公告)日:1983-07-27
Verbindungen der Formel l und ll
worin R1, R2, R3, R4, R5 und R6, X, Y und n die im Anspruch 1 definierte Bedeutung haben, sind latente Härtungskatalysatoren für sauer härtbare Einbrennlacke. Sie zeichnen sich durch eine einwandfreie Löslichkeit in den säurehärtbaren Harzsystemen aus, sind im Dunkeln praktisch unbegrenzt lagerbar und ermöglichen bei Belichtung mit kurzwelligem Licht eine säurekatalytische Härtung der Harze bei relativ niedriger Temperatur.
式 l 和 ll 的化合物,其中 R1、R2、R3、R4、R5 和 R6、X、Y 和 n 具有权利要求 1 中定义的含义,是酸固化搪瓷的潜在固化催化剂。 它们的特点是在酸固化树脂体系中具有完美的溶解性,几乎可以无限期地储存在黑暗中,当暴露在短波光下时,可以在相对较低的温度下对树脂进行酸催化固化。
An improved light activatable anaerobic curable composition of the type comprising:
a) an acrylate or methacrylate monomer or prepolymer;
b) a peroxide compound;
c) a ferrocenyl compound; and
d) an α- or β-sulfonyloxyacetophenone compound of the formula I, II or III.
in which R, - R10, X, Y and n are as defined in Claim 1. The α-or β-sulfonyloxyphenone compound used in the compositions of the invention are distinguished by their rapid activation over existing onium salts.
Photocatalysts for vinyl compounds activated by an electron donating hetero atom
申请人:LOCTITE (IRELAND) Ltd.
公开号:EP0249365A2
公开(公告)日:1987-12-16
Compositions of compounds having vinyl groups activated by electronically adjacent ether oxygen atoms, thioether sulfur atoms or tertiary amino atoms α- or β-sulfonyloxyacetophenone compounds which photodegrade to form sulfonic acids are photocurable by a cationic mechanism. Suitable examples of the vinyl compounds are vinyl ethers, p-stryloxy ethers and N-vinyl carbazole. Suitable examples of sulfonyloxyacetophenone compounds are the reaction products of α- or β-hydroxyacetophenone compounds and mono or plural sulfonyl chloride compounds.
Alkali soluble polymer and positive working photosensitive resin composition using the same
申请人:Etou Tomohiro
公开号:US20080131813A1
公开(公告)日:2008-06-05
The invention provides an alkali soluble polymer including a specific vinylketone phenol and a derivative thereof as radical polymerizable monomers and a positive working photosensitive resin composition containing the alkali soluble polymer and a photosensitizing agent. According to the invention, there can be provided an alkali soluble resin having high solvent resistance, high water resistance, high acid resistance, high alkali resistance, high thermal resistance, high transparency, excellent adhesiveness with a substrate, and the like and useful for the formation of a patterned resin film obtained by developing in an aqueous alkali solution and a positive working photosensitive resin composition including such an alkali soluble resin.