硬脂醇聚醚-10 | 13149-86-5

• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: 硬脂醇聚醚-10
• 英文名称: Brij 76
• 英文别名: 3,6,9,12,15,18,21,24,27,30-Decaoxaoctatetracontan-1-ol；2-[2-[2-[2-[2-[2-[2-[2-[2-(2-octadecoxyethoxy)ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethanol
• CAS: 13149-86-5
• 化学式: C₃₈H₇₈O₁₁
• 分子量: 711.031
• InChiKey: HNUQMTZUNUBOLQ-UHFFFAOYSA-N

物化性质

• 沸点：
  704.6±55.0 °C(Predicted)
• 密度：
  0.991±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  7
• 重原子数：
  49
• 可旋转键数：
  46
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  113
• 氢给体数：
  1
• 氢受体数：
  11

安全信息

• 海关编码：
  2918990090

反应信息

• 作为反应物：
  描述：

  异氰酸丙基三乙氧基硅烷 、 硬脂醇聚醚-10 在 二月桂酸二丁基锡 作用下， 以 乙酸乙酯 为溶剂， 反应 5.0h， 生成
  参考文献：
  名称：

  Surface treatment composition and process

  摘要：

  该发明涉及一种组合物，其包括具有化学式（I）的化合物：Rf—B—Ro-Z和具有化学式（II）和/或其反应产物的化合物。该发明适用于处理表面，特别是透明基板。

  公开号：

  US20040176600A1
• 作为产物：
  描述：

  环氧乙烷 、 硬脂醇 在 氢氧化钾 作用下， 反应 1.5h， 以4.6 mol的产率得到硬脂醇聚醚-5
  参考文献：
  名称：

  Anionic alkoxylate surfactant from conjugated unsaturated alcohol

  摘要：

  本发明涉及一种阴离子烷氧基化表面活性剂（I），其中R是二元或三元不饱和的C4-22直链或支链碳氢链，所述不饱和链的至少两个双键是共轭的，并呈现相反的几何异构体；m为0或1；Y为O或NR；每个R40独立地选自氢、C1-6烷基和苯基；n为1至50；OX是从硫酸盐、磷酸盐、磺酸琥珀酸盐、琥珀酸盐、羧甲基、马来酸盐、羧乙基、烯丙基琥珀酸盐、邻苯二甲酸盐、烷基磺酸盐、3-磺酸基-2-羟基丙基、磺酸丙基、草酸盐和柠檬酸盐组成的群体中选择的阴离子基团。

  公开号：

  US06335314B1
• 作为试剂：
  描述：

  4-溴-1,2-亚甲二氧基苯 在 硬脂醇聚醚-10 、 溶剂黄146 作用下， 反应 18.0h， 以23.2%的产率得到5-bromo-6-iodobenzo[d][1,3]dioxole
  参考文献：
  名称：

  Identification of Potent Water Soluble Purine-Scaffold Inhibitors of the Heat Shock Protein 90

  摘要：

  Hsp90 is a chaperone protein that allows cancer cells to tolerate the many components of dysregulated pathways. Its inactivation may result in targeting multiple molecular alterations and, thus, in reverting the transformed phenotype. The PU-class, a purine-scaffold Hsp90 inhibitor series, has been reported to be potent and selective against Hsp90 both in vitro and in vivo models of cancer. Here, a series of this class was synthesized and evaluated as inhibitors of the chaperone. The structure-activity relationship and selectivity for tumor Hsp90 of compounds within the series is presented. The study identifies water soluble derivatives (> 5 mM in PBS pH 7.4) of nanomolar potency (IC50 similar to 50 nM) in cellular and animal models of cancer. Binding affinities of these compounds for Hsp90 correlate well with their biological activities. When administered in vivo to mice bearing MDA-MB-468 human breast cancer xenocyrafted tumors, these agents result in pharmacologically relevant concentrations and, accordingly, in modulation of Hsp90-client proteins in tumors.

  DOI：

  10.1021/jm0508078

文献信息

• Particles with improved solubilization capacity
  申请人：——

  公开号：US20030022242A1

  公开（公告）日：2003-01-30

  A particle is disclosed that comprises a first volume of hydrophobe-rich material with tunable dissolution and solubilization characteristics and a distinct second volume of nanostructured nonlamellar liquid crystalline material, said second volume containing said first domain and being capable of being in equilibrium with said first volume. Preferably, the nanostructured nonlamellar liquid crystalline material is capable of being in equilibrium with a polar solvent or a water-immiscible solvent or both.

  揭示了一种颗粒，包括具有可调溶解和溶解特性的第一体积的疏水基质材料和独特的第二体积的纳米结构非层状液晶材料，所述第二体积包含所述第一领域，并能够与所述第一体积处于平衡状态。优选，所述纳米结构非层状液晶材料能够与极性溶剂或水不相溶溶剂或两者同时处于平衡状态。
• Print pastes for reactive printing
  申请人：Cognis Deutschland GmbH & Co. KG

  公开号：EP1249477A1

  公开（公告）日：2002-10-16

  Pasty preparation for reactive printing, containing at least A) a thickener based on polysaccharides B) an additive selected from the group consisting of B1) the saturated and/or unsaturated ethoxylated fatty alcohols, fatty amines and fatty acids having a degree of alkoxylation of 6 to 20 and/or the group consisting of B2) alkyl(oligo)glycosides of the formula R-O[G]p where R is a saturated or unsaturated alkyl radical of 1 to 6 carbon atoms, G is a glycoside radical and p is from 1 to 10, C) a reactive dye and D) an alkaline colour fixative.

  用于活性印刷的糊状制剂，至少含有 A) 基于多糖的增稠剂 B) 选自以下组别的添加剂 B1) 烷氧基化程度为 6 至 20 的饱和和/或不饱和乙氧基化脂肪醇、脂肪胺和脂肪酸 和/或由以下物质组成的组 B2) 式 R-O[G]p 的烷基（低聚）糖苷，其中 R 为 1 至 6 个碳原子的饱和或不饱和烷基，G 为糖苷基，p 为 1 至 10、 C) 活性染料和 D) 一种碱性固色剂。
• Slurry composition for chemical mechanical polishing
  申请人：SAMSUNG ELECTRONICS CO., LTD.

  公开号：US10428242B2

  公开（公告）日：2019-10-01

  A slurry composition for chemical mechanical polishing, the slurry composition including ceramic polishing particles; a dispersion agent; a pH control agent and an additive having affinity with silicon nitride.

  一种用于化学机械抛光的浆料组合物，浆料组合物包括抛光陶瓷颗粒、分散剂、pH 值控制剂和与氮化硅有亲和力的添加剂。
• Slurry composition for chemical mechanical polishing, method of preparing the same, and method of fabricating semiconductor device by using the same
  申请人：Samsung Electronics Co., Ltd.

  公开号：US10829690B2

  公开（公告）日：2020-11-10

  Disclosed is a slurry composition for chemical mechanical polishing (CMP) includes, as polishing particles, a complex compound of both fullerenol and alkylammonium hydroxide. The slurry composition, which exhibits excellent polishing properties, may be prepared at low cost in large quantities. Also disclosed is a method of preparing the slurry composition comprising obtaining a mixture of a fullerenol complex compound and unreacted hydrogen peroxide by reacting alkylammonium hydroxide, hydrogen peroxide, and fullerene, removing the unreacted hydrogen peroxide by adding hydrogen peroxide decomposition catalyst particles to the mixture, separating the hydrogen peroxide decomposition catalyst particles from the mixture by filtration, and adding a polishing additive to the mixture. Further disclosed is a method of fabricating a semiconductor device that includes providing a pattern defining a trench, forming a metal material film on the pattern to fill the trench, and performing CMP of the metal material film using the slurry composition.

  公开了一种用于化学机械抛光（CMP）的浆料组合物，其中包括富勒烯醇和氢氧化烷基铵的复合物作为抛光颗粒。这种浆料组合物具有优异的抛光性能，可以低成本大量制备。还公开了一种制备该浆料组合物的方法，包括通过使氢氧化烷基铵、过氧化氢和富勒烯反应获得富勒烯醇复合物和未反应的过氧化氢的混合物，通过向混合物中加入过氧化氢分解催化剂颗粒去除未反应的过氧化氢，通过过滤将过氧化氢分解催化剂颗粒从混合物中分离出来，以及向混合物中加入抛光添加剂。进一步公开了一种制造半导体器件的方法，该方法包括提供限定沟槽的图案，在图案上形成金属材料膜以填充沟槽，以及使用浆料组合物对金属材料膜进行 CMP。
• Slurry composition and method of manufacturing integrated circuit device by using the same
  申请人：SAMSUNG ELECTRONICS CO., LTD.

  公开号：US11186749B2

  公开（公告）日：2021-11-30

  A slurry composition is disclosed which includes: a corrosion inhibitor including a material selected from carbon allotropes and derivatives thereof; and an oxidant. A method of manufacturing an integrated circuit device is disclosed which includes: forming a first metal film and a second metal film on a substrate, the first metal film and the second metal film respectively including different metals; and polishing, by using the slurry composition, a polishing target surface at which the first metal film and the second metal film are exposed.

  本发明公开了一种浆料组合物，其中包括：一种腐蚀抑制剂，包括一种选自碳同素异形体及其衍生物的材料；以及一种氧化剂。本发明公开了一种制造集成电路器件的方法，包括：在基板上形成第一金属膜和第二金属膜，第一金属膜和第二金属膜分别包括不同的金属；以及通过使用浆料组合物抛光第一金属膜和第二金属膜暴露的抛光目标表面。