Direct Fluorination of Adamantanes with Iodine Pentafluoride
作者:Shoji Hara、Motoshi Aoyama
DOI:10.1055/s-2008-1067205
日期:2008.8
Direct fluorination of adamantanes was achieved by iodinepentafluoride and one or two fluorine atoms were introduced selectively on the tertiary carbons of adamantanes.
金刚烷的直接氟化是通过五氟化碘实现的,并在金刚烷的叔碳上选择性地引入一个或两个氟原子。
RADIATION-SENSITIVE RESIN COMPOSITION
申请人:JSR Corporation
公开号:EP1602975A1
公开(公告)日:2005-12-07
A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing-resin is smaller than 1.5.
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
申请人:JSR Corporation
公开号:EP2003148A2
公开(公告)日:2008-12-17
An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
申请人:JSR CORPORATION
公开号:US10082733B2
公开(公告)日:2018-09-25
An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
Synthesis of functionalized adamantanes from fluoroadamantanes
作者:Motoshi Aoyama、Shoji Hara
DOI:10.1016/j.tet.2009.02.059
日期:2009.5
Selective introduction of functional groups on the tert-carbon of adamantane was performed by substitution with fluorides. A methyl, phenacyl, aryl, cyclohexyl, alkoxy, or azido group was introduced into the adamantane skeleton without influencing the other functional groups present. Various functionalized adamantanes were synthesized using this scheme. A fluorinated analog of memantine (3-fluoro-5,7-dimethyl-1-adamantylammoniurn acetate 25) was synthesized from methyl 3,5-dimethyladamantane-1-carboxylate 6. (C) 2009 Elsevier Ltd. All rights reserved.