Method for photolytically deprotecting immobilized nucleoside derivatives, especially in the production of DNA chips
申请人:NIGU CHEMIE GMBH
公开号:US20020053508A1
公开(公告)日:2002-05-09
The invention relates to a method for the specific photolytic deprotection of nucleoside derivatives that are immobilized on a substrate, especially for use in the production of DNA chips. Said method is characterized in that a gel or viscous liquid layer is applied on the nucleoside derivatives that are immobilized on a substrate. Said gel or viscous liquid contains one or more polymer compounds and at least one representative from the group comprising water, water/C
1
-C
4
alcohol mixtures and polar aprotic solvents. For initiating the deprotection, the nucleoside derivates are irradiated. This method favors a rapid, clean and complete removal of the photolabile protective groups from the nucleoside derivatives, which results in the required purity of the synthesized nucleotide or oligonucleotide sequences.
本发明涉及一种对固定在基底上的核苷衍生物进行特定光解保护的方法,特别是用于生产 DNA 芯片。该方法的特点是在固定在基底上的核苷衍生物上涂敷一层凝胶或粘稠液体。所述凝胶或粘稠液体含有一种或多种高分子化合物,以及至少一种由水、水/C
1
-C
4
醇混合物和极性钝化溶剂。为了启动脱保护,核苷衍生物需要经过辐照。这种方法有利于快速、干净、彻底地去除核苷衍生物上的光敏保护基团,从而使合成的核苷酸或寡核苷酸序列达到所需的纯度。