6,6-dimethyl-5,6-dihydrophenanthridine | 22364-42-7

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 喹啉及其衍生物
• 英文名称: 6,6-dimethyl-5,6-dihydrophenanthridine
• 英文别名: 6,6-dimethyl-5,6-dihydro-phenanthridine；5,6-Dihydro-6,6-dimethyl-phenanthridin；6,6-dimethyl-5H-phenanthridine
• CAS: 22364-42-7
• 化学式: C₁₅H₁₅N
• 分子量: 209.291
• InChiKey: XCIKRLDNXHESDG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.7
• 重原子数：
  16
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  12
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  2-异丙基苯硼酸 在 四(三苯基膦)钯 、 sodium azide 、 carbonyl(5,10,15,20-tetraphenylporphyrinato)ruthenium(II) 、 potassium carbonate 、 sodium nitrite 作用下， 以 邻二氯苯 为溶剂， 反应 1.0h， 生成 6,6-dimethyl-5,6-dihydrophenanthridine
  参考文献：
  名称：

  [Ru（TPP）CO]催化的分子内Benzylic C ？H键胺化，可负担的菲啶和二氢菲啶衍生物

  摘要：

  发现叠氮化物上的光：[Ru（TPP）CO]（TPP =四苯基卟啉二价阴离子），白光和O 2是执行几种联芳基叠氮化物环化反应的合适催化剂组合（请参见方案）。该方法的高化学选择性允许以高收率和纯度合成菲啶和二氢菲啶。

  DOI：

  10.1002/chem.201200888

文献信息

• Photolysis of alkyl azides. Evidence for a nonnitrene mechanism
  作者：Evan P. Kyba、Rudolph A. Abramovitch

  DOI：10.1021/ja00522a049

  日期：1980.1
• POLYMER HAVING A STRUCTURE OF POLYAMIDE, POLYAMIDE-IMIDE, OR POLYIMIDE, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, PHOTOSENSITIVE DRY FILM, AND PROTECTIVE FILM FOR ELECTRIC AND ELECTRONIC PARTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20200041903A1

  公开（公告）日：2020-02-06

  The present invention is a polymer having a polyamide structural unit, a polyamide-imide structural unit, or a polyimide structural unit, selected from a polyamide, a polyamide-imide, a polyimide, a polyimide precursor, a polybenzoxazole, and a polybenzoxazole precursor, including a reaction product of a diamine containing at least one of a diamine shown by the following general formula (1) and a diamine shown by the following general formula (2), together with at least one of a tetracarboxylic dianhydride shown by the following general formula (3) as well as a dicarboxylic acid and a dicarboxylic halide shown by the following general formula (4). This provides a polymer which is soluble in a safe organic solvent used widely, and is usable as a base resin of a positive photosensitive resin composition that is soluble in an aqueous alkaline solution and capable of forming a fine pattern to give higher resolution.