Photochemical reactions. 139th Communication. Photochemistry of acylsilanes: 1. Siloxcarbene formationversus ?-H-abstraction
作者:Markus E. Scheller、Bruno Frei
DOI:10.1002/hlca.19840670711
日期:1984.11.7
the silyl ketone 1 as well as the methyl ketone 2 undergo a Norrish type II reaction involving γ-H-abstraction and fragmentation to the diene 12, and acetone (20) or the acylsilane 26, respectively. The methyl ketone 2, but not the acylsilane 1, isomerizes to cyclobutanols (21A-D). Additionally, compound 1 shows photochemical behavior typical of acylsilanes undergoing rearrangement to the siloxycarbene
描述了酰基硅烷1和相应的甲基酮2的合成和光解。在n,π*激发下,甲硅烷基酮1和甲基酮2进行Norrish II型反应,包括γ-H吸收并断裂成二烯12和丙酮(20)或酰基硅烷26。甲基酮2而不是酰基硅烷1异构化为环丁醇(21A - D)。此外,化合物1显示出典型的酰基硅烷发生重排为甲氧化卡宾中间体c的光化学行为。将c插入烯醇28的OH-ond导致化合物13。但是,H 2 O最初捕集甲硅烷氧基碳烯c会导致化合物16 – 18的形成。作为次要光解产物1,化合物14和(Ž) - 15形成; 但是,在气相热解(520°)下的1,化合物14和(E / Z15)以92%的总收率获得。酰基硅烷1在较小程度上也经历了Norrish I型裂解,从而生成了酸19。