1-(methoxymethoxy)-4-vinylbenzene | 142357-48-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚醚
• 英文名称: 1-(methoxymethoxy)-4-vinylbenzene
• 英文别名: 1-ethenyl-4-(methoxymethoxy)benzene
• CAS: 142357-48-0
• 化学式: C₁₀H₁₂O₂
• 分子量: 164.204
• InChiKey: CQUFSHRIMFCUBU-UHFFFAOYSA-N

物化性质

• 沸点：
  259.2±23.0 °C(Predicted)
• 密度：
  1.012±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  12
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  1-(methoxymethoxy)-4-vinylbenzene 在 盐酸 、 苯基脲 、 sodium methylate 、 palladium diacetate 、 potassium carbonate 作用下， 以 甲醇 、 氯仿 、 水 、 N,N-二甲基甲酰胺 为溶剂， 反应 47.0h， 生成 4-((E)-4-((E)-4-hydroxystyryl)styryl)benzene-1,2-diol
  参考文献：
  名称：

  Phenolic Bis-styrylbenzenes as β-Amyloid Binding Ligands and Free Radical Scavengers

  摘要：

  Starting from bisphenolic bis-styrylbenzene DF-9 (4), P-amyloid (A beta) binding affinity and specificity for phenolic bis-styrylbenzenes, monostyrylbenzenes, and alkyne controls were determined by fluorescence titration with beta-amyloid peptide A beta(1-40) and a fluorescence assay using APP/PSI transgenic mouse brain sections. Bis-styrylbenzene SA R is derived largely from work on symmetrical compounds. This study is the first to describe A beta binding data for bis-styrylbenzenes unsymmetrical in the outer rings. With one exception, binding affinity and specificity were decreased by adding and/or changing the substitution pattern of phenol functional groups, changing the orientation about the central phenyl ring, replacing the alkene with alkyne bonds, or eliminating the central phenyl ring. The only compound with an A beta binding affinity and specificity comparable to 4 was its 3-hydroxy regioisomer 8. Like 4, 8 crossed the blood brain barrier and bound to A beta plaques in vivo. By use of a DPPH assay, phenol functional groups with papa orientations seem to be a necessary. but insufficient, criterion for good free radical scavenging properties in these compounds.

  DOI：

  10.1021/jm1006929
• 作为产物：
  描述：

  1-乙炔基-4-(甲氧基甲氧基)苯 在 Lindlar's catalyst 、 氢气 作用下， 以 乙醇 、 乙酸乙酯 为溶剂， 反应 1.0h， 以87%的产率得到1-(methoxymethoxy)-4-vinylbenzene
  参考文献：
  名称：

  A one-pot synthesis of unsymmetrical bis-styrylbenzenes

  摘要：

  An efficient and widely applicable one-pot synthesis of unsymmetrical (E,E)-bis-styrylbenzenes using successive Heck and Horner-Wadsworth-Emmons reactions is described. (C) 2009 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.tetlet.2009.08.083

文献信息

• SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160052877A1

  公开（公告）日：2016-02-25

  A salt represented by the formula (I); wherein Q 1 and Q 2 each independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group, L b1 represents a single bond or a divalent C 1 to C 24 saturated hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C 3 to C 18 alicyclic hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C 6 to C 20 aromatic hydrocarbon group, and Z + represents an organic sulfonium cation or an organic iodonium cation.

  根据您的要求，以下是化合物的中文翻译： 由公式(I)表示的盐； 其中Q1和Q2各自独立代表一个氟原子或一个C1至C6的过氟代烷基团，Lb1代表一个单键或一个二价的C1至C24的饱和烃基团，其中甲基烯基团可以被一个氧原子或一个羰基团所取代，并且其中氢原子可以被一个羟基或一个氟原子所取代，并且Y代表一个氢原子，一个氟原子，或一个可选地被取代的C3至C18的芳环烃基团，其中甲基烯基团可以被一个氧原子，一个羰基团或一个磺酰基团所取代；并且Ar代表一个二价的C6至C20的芳香烃基团，以及Z+代表一个有机硫正离子或一个有机碘正离子。
• SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160334702A1

  公开（公告）日：2016-11-17

  A salt represented by formula (I): wherein Q 1 and Q 2 independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group, R 1 and R 2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C 1 to C 6 perfluoroalkyl group, z represents an integer of 0 to 6, X 1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R 1 )(R 2 ) or C(Q 1 )(Q 2 ), A 1 represents a C 4 to C 24 hydrocarbon group having a C 4 to C 18 divalent alicyclic hydrocarbon moiety, A 2 represents a C 2 to C 12 divalent hydrocarbon group, R 3 and R 4 independently represent a hydrogen atom or a C 1 to C 6 monovalent saturated hydrocarbon group, R 5 represents a hydrogen atom, a fluorine atom, or a C 1 to C 6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z + represents an organic cation.

  公式(I)表示的盐，其中Q1和Q2独立地代表一个氟原子或一个C1至C6的过氟烷基团，R1和R2每次出现独立地代表一个氢原子、一个氟原子或一个C1至C6的过氟烷基团，z代表0到6的整数，X1代表*—CO—O—，*—O—CO—或—O—，*代表与C(R1)(R2)或C(Q1)(Q2)的连接位置，A1代表具有C4至C18二价脂环烃基团的C4至C24的烃基团，A2代表C2至C12的二价烃基团，R3和R4独立地代表一个氢原子或一个C1至C6的一价饱和烃基团，R5代表一个氢原子、一个氟原子或一个C1至C6的烷基团，其中氢原子可以被氟原子替换，而Z+代表一个有机阳离子。
• SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160200702A1

  公开（公告）日：2016-07-14

  A salt represented by the formula (I): wherein R 1 represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; Q 1 and Q 2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; A 1 represents a lactone ring-containing group which has 4 to 24 carbon atoms; R 2 represents an acid-labile group; and “m” represents an integer of 0 to 3.

  由公式(I)表示的盐： 其中 R1 代表一个C1至C12的烷基，其中一个亚甲基基团可以被一个氧原子或一个羰基团所取代； Q1 和 Q2 各自独立地代表一个氟原子或一个C1至C6的全氟烷基团； A1 代表一个含有内酯环的基团，该基团有4到24个碳原子； R2 代表一个酸不稳定的基团；并且 “m”代表一个0到3之间的整数。
• COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160130210A1

  公开（公告）日：2016-05-12

  A compound represented by formula (I), a resin including a structural unit derived from the compound and a resist composition including the resin: wherein R 1 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R 2 represents a C 1 to C 6 perfluoroalkyl group or *—CHR f1 R f2 , * represents a binding site to a carbonyl group, R f1 and R f2 each independently represent a C 1 to C 4 perfluoroalkyl group or R f1 and R f2 may be bonded together with a carbon atom bonded thereto to form a ring, A 1 represents a single bond, a C 1 to C 6 alkanediyl group or **-A 3 -X 1 -(A 4 -X 2 ) a -(A 5 ) b -, ** represents a binding site to an oxygen atom, A 2 , A 3 , A 4 and A 5 each independently represent a C 1 to C 6 alkanediyl group, X 1 and X 2 each independently represent —O—, —CO—O— or —O—CO—, a and b each represent 0 or 1, and W 1 represents a C 5 to C 18 divalent alicyclic hydrocarbon group.

  化合物的化学式为（I），包括从该化合物衍生的结构单元的树脂和包括该树脂的抗蚀组合物： 其中R 1 代表氢原子、卤素原子或C 1 到C 6 烷基基团，其中氢原子可以被卤素原子取代，R 2 代表C 1 到C 6 全氟烷基基团或*—CHR f1 R f2 ，*代表与羰基结合位点，R f1 和R f2 各自独立代表C 1 到C 4 全氟烷基基团或R f1 和R f2 可以与结合在一起的碳原子形成环，A 1 代表单键，C 1 到C 6 烷二基基团或**-A 3 -X 1 -(A 4 -X 2 ) a -(A 5 ) b -，**代表与氧原子结合位点，A 2 、A 3 、A 4 和A 5 各自独立代表C 1 到C 6 烷二基基团，X 1 和X 2 各自独立代表—O—、—CO—O—或—O—CO—，a和b各自代表0或1，W 1 代表C 5 到C 18 的二价脂环烃基团。
• PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160195809A1

  公开（公告）日：2016-07-07

  A photoresist composition comprising a resin having an acid-labile group; a salt represented by the formula (I); and a salt represented by the formula (B1).

  一种包括具有酸敏基团的树脂、由化学式（I）表示的盐以及由化学式（B1）表示的盐的光刻胶组合物。