Resist compositions comprising basic compounds having an imidazole skeleton and a polar functional group have an excellent resolution and an excellent focus margin and are useful in microfabrication using electron beams or deep-UV light.
包含
咪唑骨架和极性官能团的碱性化合物的抗蚀组合物具有优异的分辨率和优异的聚焦余量,并且适用于使用电子束或深紫外光进行微型加工。