A positive photosensitive composition ensuring wide exposure latitude and reduced line edge roughness not only in normal exposure (dry exposure) but also in immersion exposure, a pattern forming method using the positive photosensitive composition, and a novel resin contained in the positive photosensitive composition are provided, which are a positive photosensitive composition comprising (A) a resin having a specific lactone structure in the side chain and being capable of increasing the solubility in an alkali developer by the action of an acid and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, a pattern forming method using the positive photosensitive composition, and a novel resin contained in the positive photosensitive composition.
本发明提供了一种正感光组合物,不仅在普通曝光(干式曝光)中,而且在浸入式曝光中都能确保宽广的曝光宽容度和降低线边粗糙度;还提供了一种使用该正感光组合物的图案形成方法,以及一种包含在该正感光组合物中的新型
树脂、本发明提供了一种正感光组合物,该组合物包含(A)侧链中具有特定内酯结构并能在酸的作用下增加在碱显影剂中的溶解度的
树脂和(B)在用辐照射线或辐射照射时能生成酸的化合物;一种使用该正感光组合物的图案形成方法;以及一种包含在该正感光组合物中的新型
树脂。