PHOTORESIST COMPOSITION, COATED SUBSTRATE INCLUDING THE PHOTORESIST COMPOSITION, AND METHOD OF FORMING ELECTRONIC DEVICE
申请人:ROHM AND HAAS ELECTRONIC MATERIALS LLC
公开号:US20170192353A1
公开(公告)日:2017-07-06
A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I):
wherein, EWG, Y, R, and M
+
are the same as described in the specification.
A photoacid generator compound having Formula (I):
wherein, EWG, Y, R, and M+ are the same as described in the specification.
一种具有式 (I) 的光酸发生器化合物:
其中,EWG、Y、R 和 M+ 与说明书中所述相同。
Anodic Oxidation of Dithiane Carboxylic Acids: A Rapid and Mild Way to Access Functionalized Orthoesters
作者:Anthony D. Garcia、Matthew C. Leech、Alessia Petti、Camille Denis、Iain C. A. Goodall、Adrian P. Dobbs、Kevin Lam
DOI:10.1021/acs.orglett.0c01324
日期:2020.5.15
developed for the preparation of a wide variety of functionalized orthoesters under mild and green conditions from easily accessible dithiane derivatives. The new methodology also offers an unprecedented way to access tri(fluorinated) orthoesters, a class of compound that has never been studied before. This provides the community with a rapid and general method to prepare libraries of functionalized orthoesters