Indolizin derivatives, process for their preparation and pharmaceutical composition containing them
申请人:FUJISAWA PHARMACEUTICAL CO., LTD.
公开号:EP0519353A2
公开(公告)日:1992-12-23
A compound of the formula :
wherein
R1 is carboxy or protected carboxy,
R2 is hydrogen, lower alkyl or halogen,
R3 is aryl or ar(lower)alkyl, each of which may have suitable substituent(s), [substituted carbamoyl]-(lower)alkyl, or a group of the formula :
is heterocyclic group containing nitrogen atom, and
n is 0 or 1,
R11 is hydrogen or lower alkyl,
A is lower alkylene which may be substituted by oxo, or lower alkenylene,
Q is carbonyl or lower alkylene,
X is
in which
R4 is hydrogen or lower alkyl, and
R5 is hydrogen, lower alkyl or Y-Z-R3,
Y is bond or lower alkylene,
Z is lower alkylene, lower alkenylene, -0-or
in which R6 is hydrogen, lower alkyl, ar(lower)alkyl which may have suitable substituent(s) or amino protective group,
and pharmaceutically acceptable salts thereof, processes for their preparation and pharmaceutical compositions comprising them.
式中的化合物:
式中
R1 是羧基或受保护的羧基、
R2 是氢、低级烷基或卤素、
R3 是芳基或 ar(低级)烷基,其中每个芳基或 ar(低级)烷基都可以有合适的取代基、[取代的氨基甲酰基]-(低级)烷基或式......的基团:
是含氮原子的杂环基团,且
n 为 0 或 1、
R11 是氢或低级烷基、
A 是可被氧代取代的低级亚烷基,或低级烯基、
Q 是羰基或低级亚烷基、
X 是
其中
R4 是氢或低级烷基,以及
R5 是氢、低级烷基或 Y-Z-R3、
Y 是键或低级亚烷基
Z 是低级亚烷基、低级烯基、-0-或
其中 R6 是氢、低级烷基、可有适当取代基的 ar(低级)烷基或氨基保护基、
及其药学上可接受的盐、制备工艺和包含它们的药物组合物。