摘要:
Highly syn or anti selective addition of lower order lithium vinylcuprates generated from alkenyl bromides 1 to (R)-2,3-O-isopropylideneglyceraldehyde (2) can be achieved, respectively, depending on the substitution pattern of the vinyl moiety and the solvent. Alpha-Trimethylsilyl substituted vinylcuprates possessing an alkyl substituent Z to copper react with excellent syn selectivity in ether whereas a highly anti selective addition is observed for cuprates bearing a hydrogen atom Z or alpha to the metal in THF. A model is proposed to rationalize these complementary selectivities.