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1-乙氧基-1-甲氧基-丙烷 | 127248-84-4

中文名称
1-乙氧基-1-甲氧基-丙烷
中文别名
——
英文名称
1-ethoxy-1-methoxypropane
英文别名
——
1-乙氧基-1-甲氧基-丙烷化学式
CAS
127248-84-4
化学式
C6H14O2
mdl
——
分子量
118.176
InChiKey
CBQQIJZTSICUJL-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    111.9±8.0 °C(Predicted)
  • 密度:
    0.840±0.06 g/cm3(Predicted)
  • LogP:
    1.145 (est)

计算性质

  • 辛醇/水分配系数(LogP):
    1.4
  • 重原子数:
    8
  • 可旋转键数:
    4
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    18.5
  • 氢给体数:
    0
  • 氢受体数:
    2

SDS

SDS:c1e1d4a989aeb14ffea47ac6520b58f2
查看

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量
  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

点击查看最新优质反应信息

文献信息

  • Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer
    申请人:Central Glass Company, Limited
    公开号:US20150361026A1
    公开(公告)日:2015-12-17
    As shown by the following reaction formula, disclosed is a fluorine-containing hydroxyaldehyde production method, including the step of obtaining a fluorine-containing hydroxyaldehyde represented by the general formula (1) by reacting a fluorine-containing ketone represented by the general formula (4) and an aldehyde represented by the general formula (5) in the presence of an organic base selected from a heterocyclic compound which contains a nitrogen atom in its ring or a tertiary amine. By this production method, it is possible to obtain the fluorine-containing hydroxyaldehyde in a high yield. Furthermore, it is possible to easily obtain in high yields a fluorine-containing propanediol, which is a derivative of this fluorine-containing hydroxyaldehyde, and a fluorine-containing alcohol monomer by using the same.
    根据以下反应方程式,揭示了一种含氟羟基醛的生产方法,包括通过在选择的含氟酮(通式(4)表示)和醛(通式(5)表示)在含有从含有氮原子的杂环化合物或三级胺中选择的有机碱的情况下反应,获得由通式(1)表示的含氟羟基醛的步骤。通过这种生产方法,可以高产率地获得含氟羟基醛。此外,可以通过使用相同方法轻松高产率地获得含氟丙二醇(这是这种含氟羟基醛的衍生物)和含氟醇单体。
  • PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
    申请人:ICHIKAWA Koji
    公开号:US20120270153A1
    公开(公告)日:2012-10-25
    A photoresist composition comprising (A) a resin which has an acid-labile group-containing structural unit and a lactone ring-containing structural unit, and (B) a salt represented by formula (I): wherein Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, L 1 represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, provided that L 1 is not a single bond when n is 0, R 1 represents a hydroxy group or a hydroxy group protected by a protecting group, and Z + represents an organic cation.
    一种包括(A)具有含酸敏感基团结构单元和含内酯环结构单元的树脂,以及(B)由式(I)表示的盐的光刻胶组合物:其中Q1和Q2分别独立表示氟原子或C1-C6全氟烷基基团,n表示0或1,L1表示单键或C1-C10脂肪二基基团,其中亚甲基基团可被氧原子或羰基取代,但当n为0时,L1不是单键,R1表示羟基或被保护基团保护的羟基,Z+表示有机阳离子。
  • SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
    申请人:ANRYU Yukako
    公开号:US20120328986A1
    公开(公告)日:2012-12-27
    A salt represented by formula (I): wherein Q 1 and Q 2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, L l represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or carbonyl group, provided that L l is not a single bond when n is 0, ring W represents a C3-C36 aliphatic ring in which a methylene group may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom may be replaced by a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, R l represents a hydroxyl group or a hydroxyl group protected by a protecting group, and Z + represents an organic cation.
    一种用化学式(I)表示的盐:其中Q1和Q2分别表示氟原子或C1-C6全氟烷基基团,n表示0或1,Ll表示单键或C1-C10脂肪二基团,其中一个亚甲基基团可被氧原子或羰基取代,但当n为0时,Ll不是单键,环W表示C3-C36脂肪环,其中一个亚甲基基团可被氧原子、硫原子、羰基或磺酰基取代,氢原子可被氢氧基、C1-C12烷基基团或C1-C12烷氧基取代,Rl表示氢氧基或受保护的氢氧基,Z+表示有机阳离子。
  • SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
    申请人:MASUYAMA Tatsuro
    公开号:US20120315580A1
    公开(公告)日:2012-12-13
    A salt represented by formula (I): wherein Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A 1 represents a C1-C30 monovalent organic group, X 1 represents a C1-C10 aliphatic hydrocarbon group where a hydrogen atom may be replaced by a hydroxy group, m 1 and m 2 independently each represent an integer of 1 to 4, and Z + represents an organic cation.
    一种由化学式(I)表示的盐:其中Q1和Q2分别独立表示氟原子或C1-C6全氟烷基团,A1表示C1-C30单价有机基团,X1表示C1-C10脂肪烃基团,其中氢原子可能被羟基取代,m1和m2分别独立表示1到4的整数,Z+表示有机阳离子。
  • Novel carbazole derivative and chemically amplified radiation-sensitive resin composition
    申请人:——
    公开号:US20020172885A1
    公开(公告)日:2002-11-21
    A carbazole derivative of the following formula (1), 1 wherein R 1 and R 2 individually represent a hydrogen atom or a monovalent organic group, or R 1 and R 2 form, together with the carbon atom to which R 1 and R 2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R 3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.
    以下是该段文字的中文翻译: 一种具有以下式(1)的咔唑衍生物,其中R1和R2分别代表氢原子或一价有机基团,或者R1和R2与其结合的碳原子一起形成具有3-8个成员碳环结构或3-8个成员杂环结构的二价有机基团,R3代表氢原子或一价有机基团。该咔唑衍生物适用作为增加化学增感抗蚀性的添加剂。还公开了一种化学增感辐射敏感树脂组合物,该组合物用作化学增感抗蚀剂,包括该咔唑衍生物。
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