2-(5-oxo-4-oxa-5-homoadamantane-1-yl)oxy-2-oxoethyl methacrylate | 1338917-23-9

• 分子结构分类: 有机化合物 - 有机酸及其衍生物
• 英文名称: 2-(5-oxo-4-oxa-5-homoadamantane-1-yl)oxy-2-oxoethyl methacrylate
• 英文别名: [2-Oxo-2-[(5-oxo-4-oxatricyclo[4.3.1.13,8]undecan-1-yl)oxy]ethyl] 2-methylprop-2-enoate
• CAS: 1338917-23-9
• 化学式: C₁₆H₂₀O₆
• 分子量: 308.331
• InChiKey: UMAMZIYECXBZQJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  22
• 可旋转键数：
  6
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.69
• 拓扑面积：
  78.9
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为产物：
  描述：

  5-oxo-4-oxa-5-homoadamantane-1-ol 在 potassium carbonate 、 三乙胺 、 potassium iodide 作用下， 以 四氢呋喃 、 N,N-二甲基甲酰胺 为溶剂， 反应 8.0h， 生成 2-(5-oxo-4-oxa-5-homoadamantane-1-yl)oxy-2-oxoethyl methacrylate
  参考文献：
  名称：

  HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST

  摘要：

  一个由以下式（I）表示的同型金刚烷衍生物：其中R1和R2分别是氢原子或具有1至6个碳原子的线性、支链或环烃基，x是羟基或卤素原子，n和m分别是0到3之间的整数，但要求n和m不能同时为0。

  公开号：

  US20130022914A1

文献信息

• MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS
  申请人：Rohm and Haas Electronic Materials Korea Ltd.

  公开号：US20180059545A1

  公开（公告）日：2018-03-01

  In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I): Photoresists that comprises such polymers also are provided.

  在一个首选实施例中，提供了包含以下化学式（I）结构的聚合物： 还提供了包含这种聚合物的光刻胶。
• PHOTORESIST COMPOSITIONS AND METHODS
  申请人：Rohm and Haas Electronic Materials Korea Ltd.

  公开号：US20170090283A1

  公开（公告）日：2017-03-30

  New photoresists are provided that are useful in a variety of applications, including negative-tone development processes. Preferred resists comprise a first polymer comprising first units comprising a reactive nitrogen-containing moiety spaced from the polymer backbone, wherein the nitrogen-containing moiety produces a basic cleavage product during lithographic processing of the photoresist composition.

  提供了新的光阻剂，可用于各种应用，包括负调色剂开发过程。首选光阻剂包括第一聚合物，其中包括与聚合物骨架间隔的含有反应性氮基团的第一单元，其中氮基团在光刻处理光阻剂组合物期间产生碱性裂解产物。
• OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY
  申请人：Rohm and Haas Electronic Materials Korea Ltd.

  公开号：US20170090287A1

  公开（公告）日：2017-03-30

  Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer comprising first units comprising a reactive nitrogen-containing moiety spaced from the polymer backbone, wherein the nitrogen-containing moiety produces a basic cleavage product during lithographic processing of the photoresist composition.

  提供了适合应用在光阻剂组合物上方的面漆组合物。首选的面漆组合物包括第一聚合物，其中第一单元包括与聚合物主链相距的含反应性氮基团，氮基团在光刻加工光阻剂组合物时产生碱性裂解产物。
• MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170008982A1

  公开（公告）日：2017-01-12

  A polymer comprising recurring units derived from a polymerizable monomer having two structures of hydroxyphenyl methacrylate having a hydroxy group substituted with an acid labile group is used as base resin in a positive resist composition, especially chemically amplified positive resist composition. The resist composition forms a resist film which is processed by lithography into a pattern of good profile having a high resolution, minimal edge roughness, and etch resistance.

  一种聚合物，包含由可聚合单体衍生的重复单元，该单体具有两种羟基苯甲酸甲酯结构，羟基上取代有酸不稳定基团，作为正性光刻胶组成中的基础树脂，尤其是化学放大正性光刻胶组成中。该光刻胶组成形成一种光刻胶膜，通过光刻技术加工成具有高分辨率、最小边缘粗糙度和蚀刻抗性的良好轮廓图案。
• Photoresist compositions and methods
  申请人：Rohm and Haas Electronic Materials Korea Ltd.

  公开号：US10564542B2

  公开（公告）日：2020-02-18

  New photoresists are provided that are useful in a variety of applications, including negative-tone development processes. Preferred resists comprise a first polymer comprising first units comprising a reactive nitrogen-containing moiety spaced from the polymer backbone, wherein the nitrogen-containing moiety produces a basic cleavage product during lithographic processing of the photoresist composition.

  本文提供的新型光阻可用于多种应用，包括负色调显影工艺。优选的光刻胶由第一种聚合物组成，第一种聚合物由第一单元组成，第一单元包含与聚合物骨架间隔开的活性含氮分子，其中含氮分子在光刻胶组合物的光刻处理过程中产生碱性裂解产物。