2-(3-Hydroxy-adamantyl)-2-propanol

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-(3-Hydroxy-adamantyl)-2-propanol
• 英文别名: 3-Hydroxy-alpha,alpha-dimethyl-1-adamantanemethanol；3-(2-hydroxypropan-2-yl)adamantan-1-ol
• 化学式: C₁₃H₂₂O₂
• 分子量: 210.316
• InChiKey: FWJFAAPYFOMELX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  15
• 可旋转键数：
  1
• 环数：
  4.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  2-(3-Hydroxy-adamantyl)-2-propanol 在 吡啶 、 4-二甲氨基吡啶 、 水 、 三乙胺 、 sodium hydroxide 作用下， 以 1,4-二氧六环 、 异丙醚 、 乙腈 为溶剂， 反应 19.0h， 生成 3-[2-[3-(2-Methylprop-2-enoyloxy)-1-adamantyl]propan-2-yloxy]-3-oxopropanoic acid
  参考文献：
  名称：

  중합성 단량체, 중합체, 레지스트 재료 및 패턴 형성 방법

  摘要：

  This is a patent document related to the synthesis of a polymer containing substituents that change polarity due to the action of an acid, a polymer containing substituents that change polarity due to the action of an acid, a resist material containing this polymer as a base resin, and a method for pattern formation using this resist material. The organic compound containing a partial structure and a polymerization functional group represented by the following formula (1) has a structure that changes polarity due to the action of an acid. (In the formula, R and R independently represent a hydrogen atom, or a straight-chain, branched, or cyclic hydrocarbon group having 1 to 6 carbon atoms, and the -CH- constituting this hydrocarbon group may be substituted with -O- or -C(=O)-, and R and R may be combined to form a cyclic group with the carbon atoms to which they are attached. The dashed line represents a bonding between the organic compound containing the polymerization functional group.)

  公开号：

  KR20190022392A
• 作为产物：
  描述：

  3-羟基金刚烷-1-羧酸 在 硫酸 作用下， 以 四氢呋喃 为溶剂， 反应 14.5h， 生成 2-(3-Hydroxy-adamantyl)-2-propanol
  参考文献：
  名称：

  중합성 단량체, 중합체, 레지스트 재료 및 패턴 형성 방법

  摘要：

  This is a patent document related to the synthesis of a polymer containing substituents that change polarity due to the action of an acid, a polymer containing substituents that change polarity due to the action of an acid, a resist material containing this polymer as a base resin, and a method for pattern formation using this resist material. The organic compound containing a partial structure and a polymerization functional group represented by the following formula (1) has a structure that changes polarity due to the action of an acid. (In the formula, R and R independently represent a hydrogen atom, or a straight-chain, branched, or cyclic hydrocarbon group having 1 to 6 carbon atoms, and the -CH- constituting this hydrocarbon group may be substituted with -O- or -C(=O)-, and R and R may be combined to form a cyclic group with the carbon atoms to which they are attached. The dashed line represents a bonding between the organic compound containing the polymerization functional group.)

  公开号：

  KR20190022392A

文献信息

• Die Synthese von 1,3-disubstituierten Adamantanen
  作者：Walter Fischer、Cyril A. Grob、Hajime Katayama

  DOI：10.1002/hlca.19760590609

  日期：——

  Synthesis of 1,3-Disubstituted Adamantanes.

  1,3-二取代金刚烷的合成。
• Polymeric compound and resin composition for photoresist
  申请人：——

  公开号：US20020169266A1

  公开（公告）日：2002-11-14

  A photoresist polymeric compound includes a monomer unit represented by following Formula (I): 1 The polymeric compound may further include at least one of monomer units represented by following Formulae (IIa) to 2 wherein R 1 , R 13 , R 14 and R 15 are each a hydrogen atom or methyl group; R 2 and R 3 are each a hydrocarbon group having from 1 to 8 carbon atoms; R 4 , R 5 and R 6 are each a hydrogen atom, hydroxyl group or a methyl group; R 7 and R 8 are each a hydrogen atom, hydroxyl group or —COOR 9 group, where R 9 is a t-butyl group, 2-tetrahydropyranyl group, etc.; R 10 and R 11 are each a hydrogen atom, hydroxyl group or oxo group; R 12 is a hydrocarbon group having a tertiary carbon atom at a bonding site with an oxygen atom indicated in the formula; R 16 is a t-butyl group, 2-tetrahydropyranyl group, etc.; and n denotes an integer from 1 to 3. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.

  一种光阻聚合物化合物包括以下式(I)所表示的单体单元：1该聚合物化合物还可以包括以下式(IIa)至(IIb)所表示的至少一种单体单元中的至少一种：其中，R1、R13、R14和R15均为氢原子或甲基基团；R2和R3均为具有1至8个碳原子的碳氢基团；R4、R5和R6均为氢原子、羟基或甲基基团；R7和R8均为氢原子、羟基或-COOR9基团，其中R9为叔丁基基团、2-四氢呋喃基团等；R10和R11均为氢原子、羟基或酮基；R12为具有在公式中指示的氧原子与三级碳原子成键位的碳氢基团；R16为叔丁基基团、2-四氢呋喃基团等；n表示1至3的整数。该光阻聚合物化合物可以表现出对基材的高粘附性，并可以高精度地形成细小图案。
• Process for producing vinyl ether compounds
  申请人：Ishii Yasutaka

  公开号：US20060205957A1

  公开（公告）日：2006-09-14

  A process produces vinyl ether compounds and includes allowing a vinyl ester compound represented by following Formula (1): wherein R 1 , R 2 , R 3 and R 4 are the same or different and are each a hydrogen atom or an organic group, to react with a hydroxy compound represented by following Formula (2): R 5 OH  (2) wherein R 5 is an organic group, in the presence of at least one transition element compound to thereby yield a vinyl ether compound represented by following Formula (3): wherein R 2 , R 3 , R 4 and R 5 have the same meanings as defined above. Such transition element compounds include iridium compounds and other compounds containing Group VIII elements.

  该过程生产乙烯基醚化合物，包括让以下式(1)所代表的乙烯酯化合物与以下式(2)所代表的羟基化合物反应：其中R1、R2、R3和R4相同或不同，分别为氢原子或有机基团；R5为有机基团；在至少一种过渡金属化合物的存在下，从而产生以下式(3)所代表的乙烯基醚化合物：其中R2、R3、R4和R5的含义如上所定义。这样的过渡金属化合物包括铱化合物和其他含有第八族元素的化合物。
• POLYMERIC COMPOUND FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST
  申请人：Daicel Chemical Industries, Ltd.

  公开号：EP1172694A1

  公开（公告）日：2002-01-16

  A photoresist polymeric compound includes a monomer unit represented by following Formula (I) : The polymeric compound may further include at least one of monomer units represented by following Formulae (IIa) to (IIg): wherein R1, R13, R14 and R15 are each a hydrogen atom or methyl group; R2 and R3 are each a hydrocarbon group having from 1 to 8 carbon atoms; R4, R5 and R6 are each a hydrogen atom, hydroxyl group or a methyl group; R7 and R8 are each a hydrogen atom, hydroxyl group or -COOR9 group, where R9 is a t-butyl group, 2-tetrahydropyranyl group, etc.; R10 and R11 are each a hydrogen atom, hydroxyl group or oxo group; R12 is a hydrocarbon group having a tertiary carbon atom at a bonding site with an oxygen atom indicated in the formula; R16 is a t-butyl group, 2-tetrahydropyranyl group, etc.; and n denotes an integer from 1 to 3. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.

  一种光致抗蚀剂聚合化合物包括下式（I）所代表的单体单元： 该聚合化合物还可进一步包括下式（IIa）至（IIg）所代表的单体单元中的至少一种： 其中 R1、R13、R14 和 R15 各为氢原子或甲基；R2 和 R3 各为具有 1 至 8 个碳原子的烃基；R4、R5 和 R6 各为氢原子、羟基或甲基；R7 和 R8 各为氢原子、羟基或-COOR9 基，其中 R9 为叔丁基、2-四氢吡喃基等。R10 和 R11 分别是氢原子、羟基或氧代基团；R12 是烃基，其上的三级碳原子与式中所示的氧原子成键；R16 是叔丁基、2-四氢吡喃基等；n 表示 1 至 3 的整数。 这种光致抗蚀剂聚合物化合物对基底有很高的附着力，并能高度精确地形成精细图案。
• Vinyl ether compounds and preparation process thereof
  申请人：Daicel Chemical Industries, Ltd.

  公开号：EP1288186A2

  公开（公告）日：2003-03-05

  A process produces vinyl ether compounds and includes allowing a vinyl ester compound represented by following Formula (1): wherein R1, R2, R3 and R4 are the same or different and are each a hydrogen atom or an organic group, to react with a hydroxy compound represented by following Formula (2):         R5OH     (2) wherein R5 is an organic group, in the presence of at least one transition element compound to thereby yield a vinyl ether compound represented by following Formula (3): wherein R2, R3, R4 and R5 have the same meanings as defined above. Such transition element compounds include iridium compounds and other compounds containing Group VIII elements. A vinyl ether compound represented by following Formula (4): wherein W is a divalent hydrocarbon; n is 0 or 1; m is an integer from 1 to 8; ring Z is any one of cyclic groups represented by following Formulae (5) through (12):

  一种生产乙烯基醚化合物的工艺，包括让下式（1）代表的乙烯基酯化合物与下式（2）代表的羟基化合物反应： 其中 R1、R2、R3 和 R4 相同或不同，且各自为氢原子或有机基团，与下式（2）所代表的羟基化合物反应： R5OH (2) 其中 R5 为有机基团，在至少一种过渡元素化合物存在的情况下，生成下式 (3) 所代表的乙烯基醚化合物： 其中 R2、R3、R4 和 R5 的含义与上述定义相同。此类过渡元素化合物包括铱化合物和其他含有第八族元素的化合物。 由下式（4）表示的乙烯基醚化合物： 其中 W 为二价烃；n 为 0 或 1；m 为 1 至 8 的整数；环 Z 为下式（5）至（12）所代表的任一环状基团：