三种具有氧化乙烯基的阴离子碳氟表面活性剂,双[2- {2-(全氟烷基)乙氧基}乙基] 2-磺基琥珀酸钠C n F 2 n +1 -CH 2 CH 2 OCH 2 CH 2 OCOCH 2 CH(SO 3 Na) COOCH 2 CH 2 OCH 2 CH 2 C n F 2 n +1(n FEOS; n由碳酸亚乙酯,马来酸酐,具有多氟烷基链的相应醇和亚硫酸氢钠制得=(4、6,或8)。表面活性剂是高度水溶性的,并且它们的Krafft点(K p)低于0℃。n FEOS的K p值低于常规碳氟化合物表面活性剂双[2-(全氟烷基)乙基] 2-磺基琥珀酸钠C n F 2 n +1 CH 2 CH 2 OCOCH 2 CH(SO 3 Na)COOCH 2 CH 2 C n F 2 n +1(n FS;n = 4、6或8)。在CMC中的表面张力(γ CMC的)ñ FEOS显示非常低的值,和4FEOS和6F
三种具有氧化乙烯基的阴离子碳氟表面活性剂,双[2- {2-(全氟烷基)乙氧基}乙基] 2-磺基琥珀酸钠C n F 2 n +1 -CH 2 CH 2 OCH 2 CH 2 OCOCH 2 CH(SO 3 Na) COOCH 2 CH 2 OCH 2 CH 2 C n F 2 n +1(n FEOS; n由碳酸亚乙酯,马来酸酐,具有多氟烷基链的相应醇和亚硫酸氢钠制得=(4、6,或8)。表面活性剂是高度水溶性的,并且它们的Krafft点(K p)低于0℃。n FEOS的K p值低于常规碳氟化合物表面活性剂双[2-(全氟烷基)乙基] 2-磺基琥珀酸钠C n F 2 n +1 CH 2 CH 2 OCOCH 2 CH(SO 3 Na)COOCH 2 CH 2 C n F 2 n +1(n FS;n = 4、6或8)。在CMC中的表面张力(γ CMC的)ñ FEOS显示非常低的值,和4FEOS和6F
METHODS AND PROCESSES FOR MODIFYING POLYMER MATERIAL SURFACE INTERACTIONS
申请人:NILSSON Jakob
公开号:US20100160478A1
公开(公告)日:2010-06-24
The invention to provide curable materials, comprising photo-reactive compounds, in particular, photoinitiators and polymerizable mono- or multifunctional monomers such as acrylates or epoxides. The material may also contain fluoro-surfactants completely or partly terminated by functional groups with the ability to bind covalently to said chemical composition under curing. The curable compositions are either purely acrylate based or a hybrid of different types of monomers such as acrylates, epoxides or vinyl ethers. The polymerizable monomers may cure with the use of different types of photoinitiator, such as free radical photoinitiators or cationic photoinitiators, ultimately forming a hybrid resist comprising interpenetrating networks of different types of monomers e.g. acrylates and epoxides. The acrylate/epoxide hybrid system has showed improved replication properties in terms of high nano-imprint lithography process fidelity, due to increased conversion of acrylates and low shrinkage.
Reducing Adhesion between a Conformable Region and a Mold
申请人:Xu Frank Y.
公开号:US20110215503A1
公开(公告)日:2011-09-08
Improved preferential adhesion and release characteristics are described with respect to a substrate and a mold having imprinting material disposed therebetween, in the absence of an a priori release layer on the mold. The imprinting material is a polymerizable material including a fluorinated surfactant and a photoinitiator. The surfactant includes —CH
2
CH
2
CH
2
O—, —CH(CH
3
)CH
2
O—, —OCH(CH
3
)CH
2
—, —CH(CH
3
)CH(CH
3
)O—, or a combination thereof.