2-(氨基羰基)苯甲酸甲酯 | 90564-02-6

• 物质功能分类: 分析化学 - 标准品 - 药典标准品和杂质标准品
• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 2-(氨基羰基)苯甲酸甲酯
• 中文别名: 2-氨基甲酰基苯甲酸甲酯
• 英文名称: methyl 2-carbamoylbenzoate
• CAS: 90564-02-6
• 化学式: C₉H₉NO₃
• 分子量: 179.175
• InChiKey: ZZOHVJNFBQBFNG-UHFFFAOYSA-N

物化性质

• 熔点：
  98-100 °C(Solv: isopropyl ether (108-20-3))
• 沸点：
  330.8±25.0 °C(Predicted)
• 密度：
  1.226±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0.5
• 重原子数：
  13
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.11
• 拓扑面积：
  69.4
• 氢给体数：
  1
• 氢受体数：
  3

安全信息

• 海关编码：
  2924299090
• 危险性防范说明：
  P261,P280,P301+P312,P302+P352,P305+P351+P338
• 危险性描述：
  H302,H315,H319,H335
• 储存条件：
  应存放在室温、干燥且密封的环境中。

反应信息

• 作为反应物：
  描述：

  2-(氨基羰基)苯甲酸甲酯 在 2,3-二氯吡嗪 、 palladium diacetate 、 caesium carbonate 、 4,5-双二苯基膦-9,9-二甲基氧杂蒽 作用下， 以 1,4-二氧六环 为溶剂， 反应 4.0h， 生成 邻苯二甲酸亚胺
  参考文献：
  名称：

  新的钯催化多米诺反应与N-（2-氯-3-3-杂芳基）芳基酰胺的分子内闭环：恶唑并[4,5-b]吡嗪的首次合成

  摘要：

  新型平面杂环的合成是基础研究的核心，因为这种支架构成了重要的不同研究领域的重要组成部分：药物发现，材料科学和农药。候选药物中通常含有众所周知的苯并恶唑，但通常需要调整其亲脂性和目标相互作用点。在这方面，恶唑并[4,5- b ]吡嗪是一种有吸引力的杂环骨架，因为它具有更高的水溶性和两个额外的氢键受体。我们在这里报告了一个新的Pd（II）催化的多米诺反应，该反应包括N-（2-氯-3-3-杂芳基）芳基酰胺的第一个Pd（II）辅助分子内环化，并通过将其应用于2的首次合成来验证其价值。取代的恶唑啉[4,5-b ]吡嗪。我们证明了多米诺反应进行需要双齿磷配体以及芳族氮原子的存在。该方法的鲁棒性通过合成23种2-取代的恶唑并[4,5- b ]吡嗪类似物而得到了很好的证实，其产率高至高，并且在反应的芳基酰胺上同时包含吸电子和供电子取代基。

  DOI：

  10.1002/adsc.201300845
• 作为产物：
  描述：

  2-(氯羰基)苯甲酸甲酯 在 硫酸 、 六甲基二硅氮烷 作用下， 生成 2-(氨基羰基)苯甲酸甲酯
  参考文献：
  名称：

  A Facile Preparation of Primary Carboxamides

  摘要：

  DOI：

  10.1055/s-1985-31257

文献信息

• Pd-Catalyzed Asymmetric Dearomatization of Indoles via Decarbonylative Heck-Type Reaction of Thioesters
  作者：Ming-Liang Han、Wei Huang、Yu-Wen Liu、Min Liu、Hui Xu、Hai Xiong、Hui-Xiong Dai

  DOI：10.1021/acs.orglett.0c03897

  日期：2021.1.1

  We report herein a palladium-catalyzed ligand-promoted asymmetric dearomatization of indoles via the decarbonylation of thioesters and the subsequent reductive Heck reaction. This protocol provides a facile and efficient way to construct an aza-quaternary stereocenter at the C2 position of indolines. A variety of functional groups and substitutions could be well tolerated, affording the substituted

  我们在本文中报道了通过硫酯的脱羰作用和随后的还原性Heck反应，钯催化的配体促进的吲哚的不对称脱芳香化作用。该协议为在二氢吲哚的C2位置构建氮杂四元立体中心提供了一种简便而有效的方法。可以很好地耐受各种官能团和取代基，从而提供具有高对映选择性的取代二氢吲哚。
• Effects of CH3OH-H2O and CH3OH solvents on rate of reaction of phthalimide with piperidine
  作者：M. Niyaz Khan

  DOI：10.1002/1097-4601(20010101)33:1<29::aid-kin4>3.0.co;2-0

  日期：2001.1.1

  where k0 is the pseudo-first-order rate constant for hydrolysis of phthalimide, kn and kOX represent nucleophilic second-order rate constants for the reaction of Pip with phthalimide and for the XO−-catalyzed cyclization of N-piperidinylphthalamide to phthalimide, respectively, and [−OX]T = [NaOH] + [−OXre], where [−OXre] = [−OHre] + [CH3Ore−]. The reversible reactions of Pip with H2O and CH3OH produce

  在含有哌啶 (Pip) 的情况下，邻苯二甲酰亚胺裂解的伪一级速率常数 (kobs) 与在含有 2% 的混合水溶剂中的恒定甲醇含量下的总 Pip ([Pip]T) 浓度呈线性变化v/v 乙腈。这种 kobs 对 [Pip]T 的线性变化存在于 10%–~80% v/v 的甲醇含量范围内。kobs 的变化与 [Pip]T 在 98% v/v CH3OH 混合甲醇-乙腈溶剂中的变化显示以下关系：kobs = k[Pip]T + k[Pip]，其中 k 和 k 分别代表明显的秒邻苯二甲酰亚胺的亲核和一般碱催化哌啶解的 - 级和三级速率常数。在 0.03 M NaOH 和 20 以及 50% v/v CH3OH 下，在 [Pip]T 范围 0.02–0.40 M 内获得的 kobs 值揭示了这种关系：kobs = k0/(1 + kn[Pip]/kOX[ -OX]T}), 其中 k0 是邻苯二甲酰亚胺水解的准一级速率常数，kn
• Pyrimidinone Compounds As Calcilytics
  申请人：Shcherbakova V. Irina

  公开号：US20070197555A1

  公开（公告）日：2007-08-23

  The pyrimidinone compounds are disclosed. Methods of preparing the pyrimidinone compounds are also disclosed.

  本发明公开了嘧啶酮化合物。本发明还公开了制备嘧啶酮化合物的方法。
• Heteroaryl sulfonamides and CCR2
  申请人：ChemoCentryx, Inc.

  公开号：EP2354126A1

  公开（公告）日：2011-08-10

  A compound of the formula (I), or a salt thereof: where Ar is selected from the group consisting of substituted or unsubstituted C6-10 aryl and substituted or unsubstituted 5- to 10-membered heteroaryl; R1 is selected from the group consisting of hydrogen, unsubstituted C1 alkyl, substituted or unsubstituted C3-8 alkyl, substituted or unsubstituted C2-6alkenyl, substituted or unsubstituted C2-6 alkynyl, and substituted or unsubstituted 3- to 10-membered heterocyclyl; Y1 is selected from the group consisting of -CR2a-, -N-, and -N+(O)--; Y2 is selected from the group consisting of -CR2b-, -N-, and -N+(O)--; Y3 is selected from the group consisting of -CR2c-, -N-, and -N+(O)--; R2a, R2b, and R2c are each independently selected from the group consisting of hydrogen, halogen, -CN, -C(O)R3, -CO2R, -C(O)NR3R4, -OR3, -OC(O)R3, -OC(O)NR3R4, -SR3, -S(O)R3, -S(O)2R3, -S(O)2NR3R4, -NO2, -NR3R4, -NR3C(O)R4, -NR3C(O)OR4, - NR3S(O)2R4, -NR3C(O)NR4R5, substituted or unsubstituted C1-8 alkyl, substituted or unsubstituted C2-8 alkenyl, substituted or unsubstituted C2-8 alkynyl, substituted or unsubstituted 3- to 10-membered heterocyclyl, substituted or unsubstituted C6-10 aryl, and substituted or unsubstituted 5- to 10-membered heteroaryl; R3, R4, and R5 are each independently selected from the group consisting of hydrogen, substituted or unsubstituted C1-8 alkyl, substituted or unsubstituted C2-8 alkenyl, substituted or unsubstituted C2-8 alkynyl, substituted or unsubstituted C6-10 aryl, substituted or unsubstituted 5- to 10-membered heteroaryl, and substituted or unsubstituted 3- to 10-membered heterocyclyl; R3 and R4, R4 and R5 or R3 and R5 may, together with the atoms to which they are attached, form a substituted or unsubstituted 5-, 6-, or 7-membered ring; Y4 is selected from the group consisting of -N- and -N+(O)--; L is selected from the group consisting of a bond, -O-, -S-, -S(O)-, S(O)2-, -CR6R7-, - NR8-, -C(O)- and -NR8C(O)-; R6 and R7 are each independently selected from the group consisting of hydrogen, halogen, substituted or unsubstituted C1-8alkyl, substituted or unsubstituted 3- to 10-membered heterocyclyl, substituted or unsubstituted C2-6 alkenyl, substituted or unsubstituted C2-6alkynyl, -CN, -OR9, -NR10R11, -S(O)R9, and -S(O)2R9; R6 and R7 may, together with the carbon atom to which they are attached, form substituted or unsubstituted C3-8 cycloalkyl or substituted or unsubstituted 3- to 10-membered heterocyclic ring; R9 is selected from the group consisting of hydrogen, substituted or unsubstituted C1-8 alkyl, substituted or unsubstituted C2-8 alkenyl, substituted or unsubstituted C2-8 alkynyl, substituted or unsubstituted C6-10 aryl, substituted or unsubstituted 5- to 10-membered heteroaryl, and substituted or unsubstituted 3- to 10-membered heterocyclyl; R10 and R11 are each independently selected from the group consisting of substituted or unsubstituted C1-8 alkyl, substituted or unsubstituted 3- to 10-membered heterocyclyl, substituted or unsubstituted C6-10 aryl, substituted or unsubstituted 5- to 10-membered heteroaryl, substituted or unsubstituted C2-8 alkenyl, and substituted or unsubstituted C2-8alkynyl; R10 and R11 of -NR10R11 may, together with the nitrogen, form a substituted or unsubstituted C3-8 cycloalkyl or substituted or unsubstituted 3- to 10-membered heterocyclyl; R8 is selected from the group consisting of hydrogen, C(O)R12, S(O)2R12, CO2R12, substituted or unsubstituted C1-8alkyl, substituted or unsubstituted 3- to 10-membered heterocyclyl, substituted or unsubstituted C2-6 alkenyl, and substituted or unsubstituted C2-6 alkynyl; R12 is selected from the group consisting of substituted or unsubstituted C1-8alkyl, substituted or unsubstituted C2-6 alkenyl, substituted or unsubstituted C2-6 alkynyl, substituted or unsubstituted 3- to 1 0-membered heterocyclyl, substituted or unsubstituted C6-10 aryl, and substituted or unsubstituted 5- to 10-membered heteroaryl; Z1 is selected from the group consisting of substituted or unsubstituted C6-10 aryl, substituted or unsubstituted 5- to 10-membered heteroaryl, substituted or unsubstituted 3- to 10-membered heterocyclyl, and -NR13R14; R13 and R14 are each independently selected from the group consisting of hydrogen, substituted or unsubstituted C1-8 alkyl, substituted or unsubstituted C2-8 alkenyl, substituted or unsubstituted C2-8 alkynyl, substituted or unsubstituted 3- to 10-membered heterocyclyl, substituted or unsubstituted C6-10 aryl, substituted or unsubstituted 5- to 10-membered heteroaryl, substituted or unsubstituted (61-4 alkyl)-(C6-10 aryl), and substituted or unsubstituted (C1-4 alkyl)-(5- to 10-membered heteroaryl); R13 and R14 may, together with the nitrogen, form a substituted or unsubstituted 4-, 5-, 6-, or 7-membered heterocyclyl with the proviso that compounds of formula CC are excluded: where X14 is selected from the group consisting of -Cl, -NO2, -OCH3, -CH3, -NHC(O)CH3, and -CH2CH2-(phenyl); R65 is selected from the group consisting of hydrogen, substituted or unsubstituted C1-4 alkyl, and substituted or unsubstituted -SO2(phenyl); and R60 is selected from the group consisting of -NR61CH2CH2OR62, - NR61CH2CH2NR63R64, -NR61CH2CH2SR62, where R61 is selected from the group consisting of hydrogen and substituted or unsubstituted phenyl; R62 is selected from the group consisting of substituted or unsubstituted phenyl, and substituted or unsubstituted C1-4alkyl; and R63 and R64 are each independently selected from the group consisting of hydrogen, substituted or unsubstituted C1-8 alkyl, substituted or unsubstituted phenyl, substituted or unsubstituted -SO2(phenyl), -C(O)CH3, -C(O)C(O)OH, and -C(O)2C(CH3)3.

  本发明涉及式(I)的化合物或其盐： 其中： - Ar选自取代或未取代的C6-10芳基和取代或未取代的5-10元杂芳基； - R1选自氢、未取代的C1烷基、取代或未取代的C3-8烷基、取代或未取代的C2-6烯基、取代或未取代的C2-6炔基，以及取代或未取代的3-10元杂环基； - Y1、Y2和Y3各自独立地选自-CR2a-、-N-和-N+ (O)--； - R2a、R2b和R2c各自独立地选自氢、卤素、-CN、-C(O)R3、-CO2R、-C(O)NR3R4、-OR3、-OC(O)R3、-OC(O)NR3R4、-SR3、-S(O)R3、-S(O)2R3、-S(O)2NR3R4、-NO2、-NR3R4、-NR3C(O)R4、-NR3C(O)OR4、-NR3S(O)2R4、-NR3C(O)NR4R5，取代或未取代的C1-8烷基、取代或未取代的C2-8烯基、取代或未取代的C2-8炔基、取代或未取代的3-10元杂环基、取代或未取代的C6-10芳基，以及取代或未取代的5-10元杂芳基； - R3、R4和R5各自独立地选自氢、取代或未取代的C1-8烷基、取代或未取代的C2-8烯基、取代或未取代的C2-8炔基、取代或未取代的C6-10芳基、取代或未取代的5-10元杂芳基，以及取代或未取代的3-10元杂环基； - R3和R4、R4和R5或R3和R5可能与所连接的原子一起形成取代或未取代的5-、6-或7元环； - Y4选自-N-和-N+ (O)--； - L选自键、-O-、-S-、-S(O)-、-S(O)2 -、-CR6R7 -= -NR8-、-C(O)-和-NR8C(O)-； - R6和R7各自独立地选自氢、卤素、取代或未取代的C1-8烷基、取代或未取代的3-10元杂环基、取代或未取代的C2-6烯基、取代或未取代的C2-6炔基、-CN、-OR9、-NR10R11、-S(O)R9和-S(O)2R9； - R6和R7可能与所连接的碳原子一起形成取代或未取代的C3-8环烷基或取代或未取代的3-10元杂环基； - R9选自氢、取代或未取代的C1-8烷基、取代或未取代的C2-8烯基、取代或未取代的C2-8炔基、取代或未取代的C6-10芳基、取代或未取代的5-10元杂芳基，以及取代或未取代的3-10元杂环基； - R10和R11各自独立地选自取代或未取代的C1-8烷基、取代或未取代的3-10元杂环基、取代或未取代的C6-10芳基、取代或未取代的5-10元杂芳基、取代或未取代的C2-8烯基，以及取代或未取代的C2-8炔基； - -NR10R11中的R10和R11可能与氮一起形成取代或未取代的C3-8环烷基或取代或未取代的3-10元杂环基； - R8选自氢、C(O)R12、S(O)2R12、CO2R12、取代或未取代的C1-8烷基、取代或未取代的3-10元杂环基、取代或未取代的C2-6烯基，以及取代或未取代的C2-6炔基； - R12选自取代或未取代的C1-8烷基、取代或未取代的C2-6烯基、取代或未取代的C2-6炔基、取代或未取代的3-10元杂环基、取代或未取代的C6-10芳基，以及取代或未取代的5-10元杂芳基； - Z1选自取代或未取代的C6-10芳基、取代或未取代的5-10元杂芳基、取代或未取代的3-10元杂环基，以及-NR13R14； - R13和R14各自独立地选自氢、取代或未取代的C1-8烷基、取代或未取代的C2-8烯基、取代或未取代的C2-8炔基、取代或未取代的3-10元杂环基、取代或未取代的C6-10芳基、取代或未取代的5-10元杂芳基、取代或未取代的(C1-4烷基)-(C6-10芳基)，以及取代或未取代的(C1-4烷基)-(5-10元杂芳基)； - R13和R14可能与氮一起形成取代或未取代的4-、5-、6-或7元杂环基； 其中化合物CC型被排除： 其中： - X14选自-Cl、-NO2、-OCH3、-CH3、-NHC(O)CH3和-CH2CH2-(苯基)； - R65选自氢、取代或未取代的C1-4烷基，以及取代或未取代的-SO2-苯基； - R60选自-NR61CH2CH2OR62、-NR61CH2CH2NR63R64，以及-NR61CH2CH2SR62； 其中： - R61选自氢和取代或未取代的苯基； - R62选自取代或未取代的苯基，以及取代或未取代的C1-4烷基； - R63和R64各自独立地选自氢、取代或未取代的C1-8烷基、取代或未取代的苯基、取代或未取代的-SO2-苯基、-C(O)CH3、-C(O)C(O)OH，以及-C(O)2C(CH3)3。
• POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP3896521A1

  公开（公告）日：2021-10-20

  Provided is a polymer that can be used as a base resin for a positive photosensitive resin composition and a negative photosensitive resin composition, wherein the positive photosensitive resin composition and the negative photosensitive resin composition are soluble in an aqueous alkaline solution, can form a fine pattern, can achieve high resolution, and have good mechanical properties even when they are cured at low temperature. Also provided are a positive photosensitive resin composition and a negative photosensitive resin composition using the polymer. The polymer is represented by general formulas (1) and/or (2): wherein T1 and T2 may be the same as, or different from, each other and represent any of -CO- and -SO2-; X1 is a tetravalent organic group; and 1 is 0 or 1; and X2 is a divalent organic group.

  本发明提供了一种聚合物，可用作正感光树脂组合物和负感光树脂组合物的基础树脂，其中正感光树脂组合物和负感光树脂组合物可溶于碱性水溶液，可形成精细图案，可实现高分辨率，即使在低温下固化也具有良好的机械性能。此外，还提供了使用该聚合物的正感光树脂组合物和负感光树脂组合物。该聚合物由通式（1）和/或（2）表示： 其中 T1 和 T2 可以彼此相同或不同，并代表 -CO- 和 -SO2- 中的任何一种；X1 是四价有机基团；1 是 0 或 1；X2 是二价有机基团。