3-methanesulfonyloxy-1-adamantyl methacrylate | 861675-46-9

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: 3-methanesulfonyloxy-1-adamantyl methacrylate
• 英文别名: (3-methylsulfonyloxy-1-adamantyl) 2-methylprop-2-enoate
• CAS: 861675-46-9
• 化学式: C₁₅H₂₂O₅S
• 分子量: 314.403
• InChiKey: HVSNDEYGPPIRBT-UHFFFAOYSA-N

物化性质

• 沸点：
  438.1±24.0 °C(Predicted)
• 密度：
  1.27±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  21
• 可旋转键数：
  5
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.8
• 拓扑面积：
  78
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  3-methanesulfonyloxy-1-adamantyl methacrylate 、 2-甲基-2-丁醇 在 4-甲氧基苯酚 1,8-二氮杂双环[5.4.0]十一碳-7-烯 作用下， 反应 36.0h， 生成 3-tert-pentyloxy-1-adamantyl methacrylate
  参考文献：
  名称：

  EP1712542

  摘要：

  公开号：
• 作为产物：
  描述：

  3-羟基-1-金刚烷基甲基丙烯酸酯 、 甲基磺酰氯 在 三乙胺 作用下， 以 四氢呋喃 、 环己烷 为溶剂， 反应 0.13h， 以95%的产率得到3-methanesulfonyloxy-1-adamantyl methacrylate
  参考文献：
  名称：

  EP1712542

  摘要：

  公开号：

文献信息

• Polymer compound, negative resist composition, and method of forming resist pattern
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US07820360B2

  公开（公告）日：2010-10-26

  There are provided a polymer compound which can form a resist pattern with excellent resolution, and a negative resist composition containing the polymer compound and a resist pattern-forming method thereof. The present invention is a polymer compound containing a structural unit (a0) represented by a general formula (a0-1) shown below. (wherein, R represents a hydrogen atom, a halogen atom, an alkyl group or a halogenated alkyl group; and R0 represents an alkyl group containing a hydroxyl group.) Also, the present invention is a negative resist composition, including: an alkali soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking agent (C), wherein the alkali soluble resin component (A) contains a polymer compound (A1) having a structural unit (a0) represented by the general formula (a0-1) shown above.

  提供了一种聚合物化合物，可以形成具有优异分辨率的抗蚀图案，以及包含该聚合物化合物的负性抗蚀组合物和其抗蚀图案形成方法。本发明是一种聚合物化合物，包含下面所示的一般式（a0-1）表示的结构单元（a0）。（其中，R代表氢原子、卤原子、烷基或卤代烷基；R0代表含有羟基的烷基。）此外，本发明是一种负性抗蚀组合物，包括：可溶于碱性树脂组分（A）、在曝光后产生酸的酸发生剂组分（B）和交联剂（C），其中碱性可溶树脂组分（A）包含具有由上述一般式（a0-1）表示的结构单元（a0）的聚合物化合物（A1）。
• POLYMERIZABLE COMPOUND HAVING ADAMANTANE STRUCTURE, PROCESS FOR PRODUCTION OF THE SAME, AND RESIN COMPOSITION
  申请人：Idemitsu Kosan Co., Ltd.

  公开号：EP2048128A1

  公开（公告）日：2009-04-15

  A polymerizable compound having a fluorinated substituent (Z) represented by the general formula (1), an adamantane structure and a polymerizable group (A) having the structure represented by the general formula (1), a production method thereof, and a photoresist composition, a thermocurable resin composition and a photocurable resin composition containing a polymer obtained using the polymerizable compound are provided. Use of the polymerizable compound with the adamantane structure and a resin composition thereof in the present invention provides in the field of photolithography the effect of preventing a liquid immersion medium from penetration and improving dry etching resistance in a liquid immersion exposure method as well as reducing adhesion to a mold and improving dry etching resistance in a nanoimprint method.

  提供了一种具有氟代取代基（Z）的可聚合化合物，其由通式（1）表示，具有金刚烷结构和聚合物化基团（A），其由通式（1）表示，以及其生产方法，以及包含使用聚合物得到的光刻胶组成、热固性树脂组成和光固性树脂组成的光聚合树脂组成。本发明中使用具有金刚烷结构的可聚合化合物和其树脂组成物在光刻领域中提供了防止液体浸润介质渗透和提高液体浸润曝光方法中的干法蚀刻抵抗性的效果，以及在纳米压印方法中减少对模具的粘附并提高干法蚀刻抵抗性的效果。
• ADAMANTANE DERIVATIVE, PROCESS FOR PRODUCING THE SAME, AND PHOTOSENSITIVE MATERIAL FOR PHOTORESIST
  申请人：IDEMITSU KOSAN CO., LTD.

  公开号：EP1803708A1

  公开（公告）日：2007-07-04

  The invention provides a novel adamantane derivative useful as a monomer for producing functional resins such as photosensitive resins particularly for use in lithography, and a method for producing the derivative. The adamantane derivative has a structure represented by formula (I-a) and the method for producing the adamantane derivative employs a corresponding adamantane derivative serving as a starting material. In formula (I), R1 represents H, CH3, or CF3; R2a represents a C1 to C30 alkyl group or a hydrocarbon group containing a C3 to C30 cycloalkyl group or a C6 to C30 aryl group, the alkyl group or the hydrocarbon group having a hetero atom; each of X1 and X2 represents O or S; Y represents a C1 to C10 alkyl group, a halogen atom, OH, or SH, or two Ys are linked to form =O or =S; k represents an integer of 0 to 14; and each of m and n is an integer of 0 to 2.

  本发明提供了一种新型的金刚烷衍生物，可用作产生功能性树脂的单体，例如用于光刻的光敏树脂，并提供了一种制备该衍生物的方法。该金刚烷衍生物具有由公式（I-a）表示的结构，制备该金刚烷衍生物的方法采用相应的金刚烷衍生物作为起始物质。在公式（I）中，R1代表H，CH3或CF3; R2a代表C1到C30烷基或含有C3到C30环烷基或C6到C30芳香基的碳氢基，该烷基或碳氢基具有杂原子; 每个X1和X2代表O或S; Y代表C1到C10烷基，卤素原子，OH或SH，或两个Y连接形成= O或= S; k表示0到14的整数; m和n各自是0到2的整数。
• Adamantane derivatives and process for producing the same
  申请人：Hatakeyama Naoyoshi

  公开号：US20070129532A1

  公开（公告）日：2007-06-07

  The present invention provides an adamantane derivative (I) having a structure represented by the general formula (I); an adamantane derivative (II) having a structure represented by the general formula (II); and a process for producing those adamantane derivatives. An alcohol form of an adamantane compound is reacted with a sulfonyl compound to obtain the adamantane derivative (II), which is then reacted with an alcohol to obtain the adamantane derivative (I). The adamantane derivative (I) and adamantane derivative (II) each having the structure represented by the general formula (I) and general formula (II), respectively, is a novel adamantyl(meth)acrylate compound and useful as a monomer for functional resins such as a photosensitive resin in the field of photolithography.

  本发明提供了一种具有通式（I）所表示的结构的金刚烷衍生物（I）；一种具有通式（II）所表示的结构的金刚烷衍生物（II）；以及用于制备这些金刚烷衍生物的方法。将金刚烷化合物的醇形式与磺酰化合物反应，以获得金刚烷衍生物（II），然后将其与醇反应以获得金刚烷衍生物（I）。具有通式（I）和通式（II）所表示的金刚烷衍生物分别是一种新的金刚烷基（甲基）丙烯酸酯化合物，并且在光刻领域的光敏树脂等功能性树脂的单体中有用。
• POLYMERIZABLE COMPOUND FOR PHOTORESIST, POLYMER THEREOF, AND PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER
  申请人：Hatakeyama Naoyoshi

  公开号：US20090253881A1

  公开（公告）日：2009-10-08

  The present invention provides a polymerizable compound having an alicyclic structure and a polymerizable group and represented by the general formula (1) or (19). The polymerizable compound exhibits high adhesion to substrates, reduced swelling during development, a reduced amount of water absorption during exposure in water, and high dry-etching resistance. Also provided are a polymer of such a polymerizable compound, a process for producing the same and a photoresist composition containing the polymer.

  本发明提供了一种具有脂环结构和聚合基的可聚合化合物，其通式表示为（1）或（19）。该可聚合化合物具有高黏附性，开发过程中膨胀减少，在水中曝光时吸水量减少，并具有高干法刻蚀抗性。还提供了这种可聚合化合物的聚合物、其生产方法以及包含该聚合物的光阻组合物。