3-methanesulfonyloxy-1-adamantyl acrylate | 928833-08-3

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: 3-methanesulfonyloxy-1-adamantyl acrylate
• 英文别名: 3-methanesulfonyloxy-1-adamantyl acylate；3-methanesulfonyloxy-1-adamantyl Acrylate；(3-methylsulfonyloxy-1-adamantyl) prop-2-enoate
• CAS: 928833-08-3
• 化学式: C₁₄H₂₀O₅S
• 分子量: 300.376
• InChiKey: PSSCPLCEEYMRQB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.1
• 重原子数：
  20
• 可旋转键数：
  5
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.79
• 拓扑面积：
  78
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  3-methanesulfonyloxy-1-adamantyl acrylate 、 乙二醇 在 4-甲氧基苯酚 、 三乙胺 水 作用下， 反应 3.0h， 以92.8%的产率得到3-(2-hydroxyethoxy)-1-adamantyl acrylate
  参考文献：
  名称：

  WO2007/29442

  摘要：

  公开号：
• 作为产物：
  描述：

  1,3-金刚烷二醇单丙烯酸酯 、 甲基磺酰氯 在 三乙胺 盐酸 、 水 作用下， 以 甲苯 为溶剂， 反应 0.08h， 生成 3-methanesulfonyloxy-1-adamantyl acrylate
  参考文献：
  名称：

  WO2007/29442

  摘要：

  公开号：

文献信息

• Polymer compound, negative resist composition, and method of forming resist pattern
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US07820360B2

  公开（公告）日：2010-10-26

  There are provided a polymer compound which can form a resist pattern with excellent resolution, and a negative resist composition containing the polymer compound and a resist pattern-forming method thereof. The present invention is a polymer compound containing a structural unit (a0) represented by a general formula (a0-1) shown below. (wherein, R represents a hydrogen atom, a halogen atom, an alkyl group or a halogenated alkyl group; and R0 represents an alkyl group containing a hydroxyl group.) Also, the present invention is a negative resist composition, including: an alkali soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking agent (C), wherein the alkali soluble resin component (A) contains a polymer compound (A1) having a structural unit (a0) represented by the general formula (a0-1) shown above.

  提供了一种聚合物化合物，可以形成具有优异分辨率的抗蚀图案，以及包含该聚合物化合物的负性抗蚀组合物和其抗蚀图案形成方法。本发明是一种聚合物化合物，包含下面所示的一般式（a0-1）表示的结构单元（a0）。（其中，R代表氢原子、卤原子、烷基或卤代烷基；R0代表含有羟基的烷基。）此外，本发明是一种负性抗蚀组合物，包括：可溶于碱性树脂组分（A）、在曝光后产生酸的酸发生剂组分（B）和交联剂（C），其中碱性可溶树脂组分（A）包含具有由上述一般式（a0-1）表示的结构单元（a0）的聚合物化合物（A1）。
• ADAMANTANE DERIVATIVE, PROCESS FOR PRODUCING THE SAME, AND PHOTOSENSITIVE MATERIAL FOR PHOTORESIST
  申请人：IDEMITSU KOSAN CO., LTD.

  公开号：EP1803708A1

  公开（公告）日：2007-07-04

  The invention provides a novel adamantane derivative useful as a monomer for producing functional resins such as photosensitive resins particularly for use in lithography, and a method for producing the derivative. The adamantane derivative has a structure represented by formula (I-a) and the method for producing the adamantane derivative employs a corresponding adamantane derivative serving as a starting material. In formula (I), R1 represents H, CH3, or CF3; R2a represents a C1 to C30 alkyl group or a hydrocarbon group containing a C3 to C30 cycloalkyl group or a C6 to C30 aryl group, the alkyl group or the hydrocarbon group having a hetero atom; each of X1 and X2 represents O or S; Y represents a C1 to C10 alkyl group, a halogen atom, OH, or SH, or two Ys are linked to form =O or =S; k represents an integer of 0 to 14; and each of m and n is an integer of 0 to 2.

  本发明提供了一种新型的金刚烷衍生物，可用作产生功能性树脂的单体，例如用于光刻的光敏树脂，并提供了一种制备该衍生物的方法。该金刚烷衍生物具有由公式（I-a）表示的结构，制备该金刚烷衍生物的方法采用相应的金刚烷衍生物作为起始物质。在公式（I）中，R1代表H，CH3或CF3; R2a代表C1到C30烷基或含有C3到C30环烷基或C6到C30芳香基的碳氢基，该烷基或碳氢基具有杂原子; 每个X1和X2代表O或S; Y代表C1到C10烷基，卤素原子，OH或SH，或两个Y连接形成= O或= S; k表示0到14的整数; m和n各自是0到2的整数。
• POLYMERIZABLE COMPOUND FOR PHOTORESIST, POLYMER THEREOF, AND PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER
  申请人：Hatakeyama Naoyoshi

  公开号：US20090253881A1

  公开（公告）日：2009-10-08

  The present invention provides a polymerizable compound having an alicyclic structure and a polymerizable group and represented by the general formula (1) or (19). The polymerizable compound exhibits high adhesion to substrates, reduced swelling during development, a reduced amount of water absorption during exposure in water, and high dry-etching resistance. Also provided are a polymer of such a polymerizable compound, a process for producing the same and a photoresist composition containing the polymer.

  本发明提供了一种具有脂环结构和聚合基的可聚合化合物，其通式表示为（1）或（19）。该可聚合化合物具有高黏附性，开发过程中膨胀减少，在水中曝光时吸水量减少，并具有高干法刻蚀抗性。还提供了这种可聚合化合物的聚合物、其生产方法以及包含该聚合物的光阻组合物。
• ADAMANTANE DERIVATIVE, RESIN COMPOSITION USING THE SAME, AND RESIN CURED PRODUCT
  申请人：Ito Katsuki

  公开号：US20100130712A1

  公开（公告）日：2010-05-27

  Provided is a cured resin of an adamantane derivative having a specific structure, which has excellent optical properties such as transparency and (long-term) light stability, long-term heat resistance, dielectric constant, and mechanical properties, and which can be utilized suitably in the field of electronic and optical materials.

  提供了一种具有特定结构的金刚烷衍生物固化树脂，该固化树脂具有优异的光学性能，如透明度和（长期）光稳定性、长期耐热性、介电常数和机械性能，可在电子和光学材料领域中得到适当利用。
• POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
  申请人：Iwashita Jun

  公开号：US20090162785A1

  公开（公告）日：2009-06-25

  There are provided a polymer compound which can form a resist pattern with excellent resolution, and a negative resist composition containing the polymer compound and a resist pattern-forming method thereof. The present invention is a polymer compound containing a structural unit (a0) represented by a general formula (a0-1) shown below. (wherein, R represents a hydrogen atom, a halogen atom, an alkyl group or a halogenated alkyl group; and R 0 represents an alkyl group containing a hydroxyl group.) Also, the present invention is a negative resist composition, including: an alkali soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking agent (C), wherein the alkali soluble resin component (A) contains a polymer compound (A1) having a structural unit (a0) represented by the general formula (a0-1) shown above.

  本发明提供了一种聚合物化合物，可以形成具有优异分辨率的抗蚀图案，以及包含该聚合物化合物的负型抗蚀组合物和其制备方法。本发明是一种聚合物化合物，其中包含下式所示的通式（a0-1）所代表的结构单元（a0）。（其中，R代表氢原子、卤素原子、烷基或卤代烷基；R0代表含有羟基的烷基。）此外，本发明还提供了一种负型抗蚀组合物，包括：碱溶性树脂组分（A）、在曝光时生成酸的酸发生器组分（B）和交联剂（C），其中碱溶性树脂组分（A）含有具有上述通式（a0-1）所代表的结构单元（a0）的聚合物化合物（A1）。