The invention provides compounds, pharmaceutical compositions comprising such compounds and methods of using such compounds to treat or prevent diseases or disorders associated with abnormal or deregulated TRK kinase activity.
作者:Alan W. Johnson、Gopala Gowada、Ahmed Hassanali、John Knox、Sam Monaco、Zia Razavi、Gerald Rosebery
DOI:10.1039/p19810001734
日期:——
A range of analogues of the natural germination stimulant, strigol, for parasitic weeds of the genera Striga and Orobanche, has been prepared. Most of the products contain an α-formyl-γ-lactone (or α-formyl-γ-lactam) grouping attached through an enol-ether linkage to the 5-position of a but-2-enolide. Some have shown sufficiently high activities as to warrant large-scale field trials.
An electrophilictrifluoromethylation of ketene silyl acetals (KSAs) by hypervalent iodine reagents 1 and 2 has been developed. The reaction proceeds under very mild conditions in the presence of a catalytic amount of trimethylsilyl bis(trifluoromethanesulfonyl)imide (up to 2.5 mol %) as a Lewis acid providing a direct access to a variety of secondary, tertiary, and quaternaryα-trifluoromethyl esters
Synthesis and structure-activity studies of alkyl-substituted .gamma.-butyrolactones and .gamma.-thiobutyrolactones: ligands for the picrotoxin receptor
作者:Daniel J. Canney、Katherine D. Holland、Jeffrey A. Levine、Ann C. McKeon、James A. Ferrendelli、Douglas F. Covey
DOI:10.1021/jm00108a034
日期:1991.4
alpha-substituted anticonvulsant to become a convulsant. In general, sulfur for oxygen heteroatom substitution in the alpha-substituted lactones resulted in improved anticonvulsant potency and spectrum of activity. Binding of these compounds to the picrotoxin site of the GABA receptor complex was demonstrated with a [35S]-tert-butylbicyclophosphorothionate radioligandbindingassay. Measurements of
MONOMERS, POLYMERS AND LITHOGRAPHIC COMPOSITIONS COMPRISING SAME
申请人:Rohm and Haas Electronic Materials LLC
公开号:US20190202955A1
公开(公告)日:2019-07-04
New monomer and polymer materials that comprise one or more Te atoms. In one aspect, tellurium-containing monomers and polymers are provided that are useful for Extreme Ultraviolet Lithography.