adamantane triol

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: adamantane triol
• 英文别名: adamantanetriol；adamantane-1,2,2-triol
• 化学式: C₁₀H₁₆O₃
• 分子量: 184.235
• InChiKey: IPRVKUPKUIJURA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.1
• 重原子数：
  13
• 可旋转键数：
  0
• 环数：
  4.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  金刚烷 、 adamantanediol 在 sodium hydroxide 、 溶剂黄146 作用下， 以 水 、 乙酸乙酯 为溶剂， 生成 adamantane triol
  参考文献：
  名称：

  Higher carboxylic acid triester of adamantane triol and lubricating oil

  摘要：

  该发明提供的新型化合物是先前未知的高碳酸三酯，例如三羟基三戊烷的高碳酸三酯，如三羟基三戊烷三辛酸酯。该化合物在高温下具有较高的运动粘度，尽管低凝点，并且在氧化气氛中具有高热稳定性，因此可用作高性能润滑油的成分。

  公开号：

  US04990691A1

文献信息

• Method of separating imide compound
  申请人：——

  公开号：US20020169331A1

  公开（公告）日：2002-11-14

  A reaction product and an imide compound can be separated from a reaction mixture obtained by reacting a substrate in the presence of the imide compound having an imide unit represented by the following formula (1): 1 wherein X represents an oxygen atom, a hydroxyl group or an acyloxy group by (A1) a solvent-crystallization step for crystallizing the imide compound with at least one solvent selected from the group consisting of a hydrocarbon, a chain ether and water, (A2) a cooling-crystallization step for crystallizing the reaction product by cooling, or (B) an extraction step for distributing the reaction product into a phase of a water-insoluble solvent and the imide compound into a phase of an aqueous solvent, respectively by using the aqueous solvent containing at least water and the water-insoluble solvent separable from the aqueous solvent. Further, the imide compound and the metal catalyst can be separated from a mixture containing the imide compound and the metal catalyst by (C) a solvent-crystallization step for crystallizing the imide compound by using a solvent for crystallization, (D) an absorption step for absorbing the metal catalyst by an absorption treatment, or (E) an extraction step for distributing the imide compound into a phase of a water-insoluble solvent and the metal catalyst into a phase of an aqueous solvent, respectively by using the aqueous solvent containing at least water and the water-insoluble solvent separable from the aqueous solvent.

  一种反应产物和一种亚酰亚胺化合物可以从通过在亚酰亚胺化合物存在的情况下将底物反应得到的反应混合物中分离出来，该亚酰亚胺化合物具有以下式（1）所表示的亚酰亚胺单元： 1 其中X代表氧原子、羟基或酰氧基 通过（A1）用羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和水等羟烃、链醚和
• Phosphorus compound
  申请人：——

  公开号：US20030109736A1

  公开（公告）日：2003-06-12

  The phosphorus-containing compound of the present invention is represented by the following formula (I), (II) or (III): 1 wherein Z 1 , Z 2 and Z 3 each represents a cycloalkane, a cycloalkene, a polycyclic aliphatic hydrocarbon or an aromatic hydrocarbon rings which may have a substituent; R represents a halogen atom, a hydroxyl, a carboxyl, a halocarboxyl (haloformyl), an alkyl, an alkoxy, an alkenyl or an aryl groups; A represents a polyvalent group corresponding to an alkane; Y 1 , Y 2 and Y 3 each represents —O—, —S— or —NR 1 —, wherein R 1 represents a hydrogen atom or an alkyl group; k is an integer of to 6; m is an integer of 0 to 2; n is an integer of not less than 1; q is an integer of 0 to 5; r is 0 or 1; and S is an integer of 1 to 4. The phosphorus-containing compound is excellent in heat resistance and is useful as flame retardants, plasticizers, or stabilizers.

  本发明的含磷化合物由以下式(I)、(II)或(III)表示：其中Z1、Z2和Z3分别表示可能具有取代基团的环烷烃、环烯烃、多环脂肪烃或芳香烃环；R表示卤素原子、羟基、羧基、卤代羧基（卤甲酰基）、烷基、烷氧基、烯基或芳基；A表示对应于烷烃的多价基团；Y1、Y2和Y3分别表示—O—、—S—或—NR1—，其中R1表示氢原子或烷基；k为0至6的整数；m为0至2的整数；n为不少于1的整数；q为0至5的整数；r为0或1；S为1至4的整数。这种含磷化合物具有优异的耐热性，可用作阻燃剂、增塑剂或稳定剂。
• [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU AU RAYONNEMENT ET PROCÉDÉ DE FORMATION DE MOTIFS AU MOYEN DE LA COMPOSITION
  申请人：FUJIFILM CORP

  公开号：WO2010035905A1

  公开（公告）日：2010-04-01

  An actinic ray-sensitive or radiation-sensitive resin composition comprising any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, -O-, -S-, -C(=O)-, -S(=O)-, -S(=O)?2- and OS(=O)2-, provided that -C(=O)O- is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M+ represents an organic onium ion.

  一种光化学射线敏感性或辐射敏感性树脂组合物，包括下面的通式(I)中的任何一种化合物；其中：Ar代表可能具有除了-(A-B)基团之外的取代基的芳香环；n为大于等于1的整数；A代表从单键、烷基基团、-O-、-S-、-C(=O)-、-S(=O)-、-S(=O)2-和OS(=O)2-中选取的任意一个或两个以上成员的组合，但不包括-C(=O)O-；B代表含有4个或更多碳原子的烃基团的基团，当n大于等于2时，两个或更多个-(A-B)基团可以相同或不同；M+代表有机离子。
• RESIST COMPOSITION CONTAINING NOVEL SULFONIUM COMPOUND, PATTERN-FORMING METHOD USING THE RESIST COMPOSITION, AND NOVEL SULFONIUM COMPOUND
  申请人：KAMIMURA Sou

  公开号：US20090042124A1

  公开（公告）日：2009-02-12

  A resist composition includes (A) a compound represented by the following formula (I): wherein each of R 1 to R 13 independently represents a hydrogen atom or a substituent, provided that at least one of R 1 to R 13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X − represents an anion containing a proton acceptor functional group.

  一种抗性组合物包括(A)由以下公式（I）所代表的化合物：其中R1至R13中的每一个独立地代表氢原子或取代基，前提是R1至R13中至少有一个是含有醇羟基的取代基；Z代表单键或二价连接基团；X-代表含有质子受体功能基团的阴离子。
• Resist composition, compound for use in the resist composition and pattern forming method using the resist composition
  申请人：Kawanishi Yasutomo

  公开号：US20060194147A1

  公开（公告）日：2006-08-31

  The invention provides a resist composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a compound for use in the resist composition and a pattern forming method using the resist composition, which are a resist composition comprising (A) a sulfonium salt represented by the following formula (I); and a pattern forming method using the resist composition: wherein R 1 represents an alkyl group or an aryl group, R 2 to R 9 each independently represents a hydrogen atom or a substituent and may combine with each other to form a ring, Z represents an electron-withdrawing divalent linking group, X n− represents an n-valent anion, n represents an integer of 1 to 3, and m represents the number of anions necessary for neutralizing the electric charge.

  该发明提供了一种用于半导体（例如IC）、液晶电路基板、热敏头等的制造工艺或其他光刻制造工艺中使用的抗蚀剂组成物，以及用于该抗蚀剂组成物的化合物和图案形成方法。该抗蚀剂组成物包括以下式（I）所表示的磺酸盐（A）；以及使用该抗蚀剂组成物的图案形成方法：其中，R1表示烷基或芳基，R2至R9各自独立地表示氢原子或取代基，并且它们可以结合在一起形成环，Z表示电子吸引性双价连接基团，Xn-表示n价阴离子，n表示1至3的整数，m表示中和电荷所需的阴离子数。