Resist compositions comprising basic compounds having a benzimidazole skeleton and a polar functional group have an excellent resolution and an excellent focus margin and are useful in microfabrication using electron beams or deep-UV light.
含有
苯并咪唑骨架和极性功能基团的碱性化合物抗蚀组合物具有优异的分辨率和优异的焦点余量,适用于使用电子束或深紫外光微加工。