申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US06774258B2
公开(公告)日:2004-08-10
Tertiary alcohol compounds of formula (1) are novel wherein R1 and R2 are C1-10 alkyl groups which may have halogen substituents, or R1 and R2 may form an aliphatic hydrocarbon ring, Y and Z are a single bond or a divalent C1-10 organic group, and k=0 or 1. Using the tertiary alcohol compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, etching resistance and substrate adhesion.
式(1)的三级醇化合物是一种新颖的化合物,其中R1和R2是C1-10烷基,可以带有卤素取代基,或者R1和R2可以形成一个脂肪族碳氢环,Y和Z是单键或二价的C1-10有机基团,k=0或1。使用这些三级醇化合物作为单体,可以得到聚合物。以该聚合物作为基础树脂的抗蚀剂组合物对高能辐射具有敏感性,并具有出色的敏感性、分辨率、蚀刻抗性和基底附着力。