5,7-dimethyl-1,3-bis(hydroxymethyl)adamantane

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 5,7-dimethyl-1,3-bis(hydroxymethyl)adamantane
• 英文别名: 5,7-dimethyl-1,3-dihydroxymethyladamantane；1,3-dimethyl-5,7-bis (hydroxymethyl)-adamantane；1,3-dimethyl-5,7-bis(hydroxymethyl)adamantane；(5,7-Dimethyladamantane-1,3-diyl)dimethanol；[3-(hydroxymethyl)-5,7-dimethyl-1-adamantyl]methanol
• 化学式: C₁₄H₂₄O₂
• 分子量: 224.343
• InChiKey: QTEXCNQLVLUGAN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2
• 重原子数：
  16
• 可旋转键数：
  2
• 环数：
  4.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  异戊酸 、 5,7-dimethyl-1,3-bis(hydroxymethyl)adamantane 在 对甲苯磺酸 作用下， 以 苯 为溶剂， 反应 4.0h， 以61.7%的产率得到
  参考文献：
  名称：

  Adamantane-containing esters as potential components of thermostable lubricating oils

  摘要：

  Some esters of dimethyladamantanedicarboxylic acids with aliphatic alcohols and the ester of dimethyladamantanedicarbinol with an aliphatic acid have been synthesized, and their properties have been studied; their viscosity-temperature properties and thermo-oxidative stability as potential components of high-temperature lubricating oils have been examined.

  DOI：

  10.1134/s0965544113060029
• 作为产物：
  描述：

  dimethyl 5,7-dimethyladamantane-1,3-dicarboxylate 在 lithium aluminium tetrahydride 、 aluminum (III) chloride 作用下， 以 乙醚 为溶剂， 反应 5.0h， 以91.4%的产率得到5,7-dimethyl-1,3-bis(hydroxymethyl)adamantane
  参考文献：
  名称：

  Adamantane-containing esters as potential components of thermostable lubricating oils

  摘要：

  Some esters of dimethyladamantanedicarboxylic acids with aliphatic alcohols and the ester of dimethyladamantanedicarbinol with an aliphatic acid have been synthesized, and their properties have been studied; their viscosity-temperature properties and thermo-oxidative stability as potential components of high-temperature lubricating oils have been examined.

  DOI：

  10.1134/s0965544113060029

文献信息

• Synthesis, Physicochemical Properties, and Thermo-Oxidative Stability of Diesters of 5,7-Dimethyl-1,3-Adamantanediol and 5,7-Dimethyl-1,3-bis(Hydroxymethyl)adamantane
  作者：E. A. Ivleva、M. R. Baimuratov、M. R. Demidov、A. V. Lukashenko、Yu. A. Malinovskaya、Yu. N. Klimochkin、V. A. Tyshchenko、I. A. Kulikova、V. V. Pozdnyakov、K. A. Ovchinnikov、K. B. Rudyak

  DOI：10.1134/s096554411808008x

  日期：2018.8

  A series of diesters on the basis of 5,7-dimethyl-1,3-adamantanediol and 5,7-dimethyl-1,3- bis(hydroxymethyl)adamantane and C3–C10 aliphatic acids have been synthesized and their physicochemical and thermo-oxidative properties have been studied. The properties of the esters obtained have been compared to those of trimethylolpropane and neopentyl glycol esters.

  已经合成了一系列基于5,7-二甲基-1,3-金刚烷二醇和5,7-二甲基-1,3-双（羟甲基）金刚烷和C 3 -C 10脂肪酸的二酯，其理化性质和已经研究了热氧化性能。已将所得酯的性质与三羟甲基丙烷和新戊二醇酯的性质进行了比较。
• Unsaturated esters of adamantane containing diols and thermo-resistant
  申请人：Battelle Development Corporation

  公开号：US04332964A1

  公开（公告）日：1982-06-01

  Diacrylate and dimethacrylate esters corresponding to the formula ##STR1## wherein R and R' are hydrogen or methyl and A is either a sigma (.sigma.) bond; a (CH.sub.2).eta. radical where .eta. is an interger that may vary from one through four; or phenylene, or an alkyl derivative thereof. The new adamantane containing difunctional olefinic monomers can then be polymerized, or copolymerized with other acrylic type olefinic monomers to produce polymers with unusual physical properties, including unusual hardness, inertness to degradable agents, and resistance to heat.

  二元酯化合物的分子式为 ##STR1## 其中R和R'为氢或甲基，A可以是sigma(.sigma.)键，(CH.sub.2).eta.基团，其中.eta.可以是从1到4的整数；或苯基或其烷基衍生物。这些含有金刚烷的双官能团烯烃单体可以与其他丙烯酸型烯烃单体共聚合，产生具有不寻常物理性质的聚合物，包括不寻常的硬度、对可降解剂的惰性和耐热性。
• RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP1602975A1

  公开（公告）日：2005-12-07

  A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing-resin is smaller than 1.5.

  一种辐射敏感树脂组合物，包括一种通过活自由基聚合获得的具有特定结构的含酸基团树脂，该树脂不溶于碱或几乎不溶于碱，但在酸的作用下可溶于碱，还包括一种光酸发生器，其中含酸基团树脂的重量平均分子量与数量平均分子量之比（重量平均分子量/数量平均分子量）小于 1.5。
• FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP2003148A2

  公开（公告）日：2008-12-17

  An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

  本发明的目的是提供一种新型含氟聚合物、一种用于液浸光刻的辐射敏感树脂组合物，该组合物含有该含氟聚合物，可使图案具有极佳的形状和极佳的焦深、其中，在液浸光刻过程中，液浸光刻用液体（如水）中与光刻胶接触的被洗脱成分的量很少，而且光刻胶膜与液浸光刻用液体（如水）之间的后退接触角较大；以及一种纯化含氟聚合物的方法。本树脂组合物包括含有通式（1）和（2）表示的重复单元且 Mw 为 1,000-50,000 的新型含氟聚合物（A）、具有酸不稳定基团的树脂（B）、辐射敏感酸发生器（C）、含氮化合物（D）和溶剂（E）。
• Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
  申请人：JSR CORPORATION

  公开号：US10082733B2

  公开（公告）日：2018-09-25

  An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

  本发明的目的是提供一种新型含氟聚合物、一种用于液浸光刻的辐射敏感树脂组合物，该组合物含有该含氟聚合物，可使图案具有极佳的形状和极佳的焦深、其中，在液浸光刻过程中，液浸光刻用液体（如水）中与光刻胶接触的被洗脱成分的量很少，而且光刻胶膜与液浸光刻用液体（如水）之间的后退接触角较大；以及一种纯化含氟聚合物的方法。本树脂组合物包括含有通式（1）和（2）表示的重复单元且 Mw 为 1,000-50,000 的新型含氟聚合物（A）、具有酸不稳定基团的树脂（B）、辐射敏感酸发生器（C）、含氮化合物（D）和溶剂（E）。