5-Fluoro-2,3-dimethylbicyclo[2.2.1]heptane

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 5-Fluoro-2,3-dimethylbicyclo[2.2.1]heptane
• 英文别名: 5-fluoro-2,3-dimethylbicyclo[2.2.1]heptane
• 化学式: C₉H₁₅F
• 分子量: 142.21
• InChiKey: LZFYDDWGDAEAHI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  10
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, METHOD OF FORMING PATTERN, AND TOP COAT MATERIAL
  申请人：Tokyo Institute of Technology

  公开号：US20140238954A1

  公开（公告）日：2014-08-28

  A method of producing a structure containing a phase-separated structure, including forming, on a substrate, a layer containing a block copolymer having a block of a polyhedral oligomeric silsesquioxane structure-containing structural unit; forming a top coat film by applying, to the layer containing the block copolymer, a top coat material which undergoes a change in polarity upon heating, and controls a surface energy of the layer containing the block copolymer; and subjecting the layer containing the block copolymer on which the top coat film is formed to phase separation by thermal annealing.
• METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, METHOD OF FORMING PATTERN AND METHOD OF FORMING FINE PATTERN
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20150034593A1

  公开（公告）日：2015-02-05

  A method of producing a structure containing a phase-separated structure, including: forming a layer including a neutralization film on a substrate; forming a layer containing a block copolymer on the layer including the neutralization film, the P A block and P B block being mutually bonded in the block copolymer, and the P B block including a structural unit other than a structural unit constituting the P A block; and subjecting the layer containing the block copolymer to an annealing treatment, such that, in the case where a surface free energy of the P A block, a surface free energy of the P B block and a surface free energy of the neutralization film are represented by a coordinate point A of the P A block, a coordinate point B of the P B block and a coordinate point N of the neutralization film, respectively in the plane of coordinates, the coordinate point N of the neutralization film is within the predetermined range.
• UNDERCOAT AGENT AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20150030773A1

  公开（公告）日：2015-01-29

  An undercoat agent used for phase separating a layer containing a block copolymer having a block of a structural unit derived from an (α-substituted) acrylate ester on a substrate, and which contains a resin component including a structural unit represented by formula (ba0-1), and/or a structural unit represented by formula (ba0-2), and a structural unit (ba0-3) having a substrate interacting group, wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R 1 and R 2 represent a halogen atom or an organic group of 1 to 20 carbon atoms which may contain an oxygen atom, a halogen atom, or a silicon atom, and n is 1 to 5.
• METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20150118397A1

  公开（公告）日：2015-04-30

  A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer solution to a substrate to form a layer containing a block copolymer and having a film thickness of less than 100 nm; and phase-separating the layer containing the block copolymer, a solvent of the block copolymer solution comprising a poor solvent exhibiting a poor solubility for a homopolymer A of one of the blocks of the block copolymer.
• METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE AND METHOD OF FORMING TOP COAT FILM
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20150291832A1

  公开（公告）日：2015-10-15

  A method of producing a structure containing a phase-separated structure, including forming a layer containing a block copolymer on a substrate; applying a top coat material to the layer containing the block copolymer to form a top coat film; and subjecting the layer including the block copolymer having the top coat film formed thereon to annealing treatment so as to conduct a phase separation of the layer, the top coat material including an organic solvent component and a polymeric compound containing a structural unit having either a dicarboxylic acid or a salt of a dicarboxylic acid, and the organic solvent component containing water and an alcohol having 3 or more carbon atoms.