申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US10591819B2
公开(公告)日:2020-03-17
A monomer of formula (1a) or (1b) is provided wherein A is a polymerizable group, R1-R6 are monovalent hydrocarbon groups, X1 is a divalent hydrocarbon, group, Z1 is an aliphatic group, Z2 forms an alicyclic group, k=0 or 1, m=1 or 2, n=1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer.
提供了式 (1a) 或 (1b) 的单体,其中 A 为可聚合基团,R1-R6 为一价烃基团,X1 为二价烃基团,Z1 为脂肪族基团,Z2 为脂环族基团,k=0 或 1,m=1 或 2,n=1 至 4。包含该聚合物的抗蚀剂组合物具有更好的显影性能,经处理后可形成具有高对比度、高分辨率和抗蚀刻性的阴图,且不溶于碱性显影剂。