Octahydro-1H-4,7-methanoindene-5,6-dicarboxylic acid | 168196-18-7

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: Octahydro-1H-4,7-methanoindene-5,6-dicarboxylic acid
• 英文别名: tricyclo[5.2.1.02,6]decane-8,9-dicarboxylic acid
• CAS: 168196-18-7
• 化学式: C₁₂H₁₆O₄
• 分子量: 224.25
• InChiKey: RBIQXRYNBGFRGN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  16
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  74.6
• 氢给体数：
  2
• 氢受体数：
  4

文献信息

• RESIST UNDERLAYER FILM-FORMING COMPOSITION, PRODUCTION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME, AND ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION
  申请人：Nakajima Makoto

  公开号：US20100210765A1

  公开（公告）日：2010-08-19

  There is provided a composition for forming a resist underlayer film that the adhesion with a resist applied on the resist underlayer film is enhanced and the collapse of a resist pattern is suppressed. A resist underlayer film-forming composition for lithography comprising: a polymer having silicon atoms in the backbone; a compound of a polycyclic structure; and an organic solvent, wherein the compound of a polycyclic structure has at least two carboxyl groups as substituents; the two carboxyl groups are individually bonded to two carbon atoms adjacent to each other forming the polycyclic structure; and the two carboxyl groups both have an endo configuration or an exo configuration, or have a cis configuration.

  提供了一种用于形成抗蚀底层膜的组合物，其增强了与施加在抗蚀底层膜上的抗蚀剂的粘附性并抑制了抗蚀图案的崩溃。一种用于光刻的抗蚀底层膜形成组合物，包括：具有硅原子的聚合物骨架；多环结构的化合物；和有机溶剂，其中，多环结构的化合物具有至少两个羧基作为取代基；这两个羧基分别与相邻的两个碳原子形成多环结构的键合；这两个羧基都具有内向构型或外向构型，或具有顺式构型。
• JPH0753453A
  申请人：——

  公开号：JPH0753453A

  公开（公告）日：1995-02-28
• JPH07206740A
  申请人：——

  公开号：JPH07206740A

  公开（公告）日：1995-08-08