RESIST UNDERLAYER FILM-FORMING COMPOSITION, PRODUCTION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME, AND ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION
申请人:Nakajima Makoto
公开号:US20100210765A1
公开(公告)日:2010-08-19
There is provided a composition for forming a resist underlayer film that the adhesion with a resist applied on the resist underlayer film is enhanced and the collapse of a resist pattern is suppressed. A resist underlayer film-forming composition for lithography comprising: a polymer having silicon atoms in the backbone; a compound of a polycyclic structure; and an organic solvent, wherein the compound of a polycyclic structure has at least two carboxyl groups as substituents; the two carboxyl groups are individually bonded to two carbon atoms adjacent to each other forming the polycyclic structure; and the two carboxyl groups both have an endo configuration or an exo configuration, or have a cis configuration.
PROCESS FOR PRODUCING t-BUTYL ESTERS OF BRIDGED-RING POLYCARBOXYLIC ACIDS
申请人:Daicel Chemical Industries, Ltd.
公开号:EP1148043A1
公开(公告)日:2001-10-24
In a process of the present invention for producing a bridged cyclic polycarboxylic acid t-butyl ester, a bridged cyclic polycarboxylic halide of following Formula (1):
(wherein ring Z is a bridged cyclic carbon ring; X is a halogen atom; and m denotes an integer of 2 or more, where ring Z may have a substituent) is allowed to react with t-butyl alcohol or its alkali metal salt to thereby yield an ester of following Formula (2):
(wherein tBu is a t-butyl group; and ring Z and m have the same meanings as defined above.) This process can commercially efficiently produce a bridged cyclic polycarboxylic acid t-butyl ester. The compound of Formula (1) can be prepared by allowing a bridged cyclic polycarboxylic acid of following Formula (3):
(wherein ring Z is a bridged cyclic carbon ring; and m denotes an integer of 2 or more, where ring Z may have a substituent) to react with a halogenating agent.
在本发明生产桥式环状多羧酸叔丁酯的工艺中,如下式(1)的桥式环状多羧酸卤化物:
(其中,环 Z 是桥接环状碳环;X 是卤素原子;m 表示 2 或 2 以上的整数,其中环 Z 可具有取代基)与叔丁醇或其碱金属盐反应,生成下式(2)的酯:
(其中 tBu 为叔丁基;环 Z 和 m 的含义与上文定义相同)。这种工艺可以商业化地高效生产桥式环状多羧酸叔丁酯。式(1)的化合物可以通过让下式(3)的桥连环状多羧酸来制备:
(其中环 Z 是桥接环状碳环;m 表示 2 或 2 以上的整数,其中环 Z 可具有取代基)与卤化剂反应。
Process for extruding polypropylene
申请人:Milliken & Company
公开号:US10711115B2
公开(公告)日:2020-07-14
A process for extruding polypropylene comprising extruding a composition comprising a polypropylene and a second acid scavenger and less than about 10 ppm of a nucleating agent.