三环[5.2.1.02,6]癸-8-基2-甲基丙酸酯 | 84962-69-6

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 中文名称: 三环[5.2.1.02,6]癸-8-基2-甲基丙酸酯
• 英文名称: Octahydro-4,7-methano-1H-inden-5-yl isobutyrate
• 英文别名: 8-tricyclo[5.2.1.02,6]decanyl 2-methylpropanoate
• CAS: 84962-69-6
• 化学式: C₁₄H₂₂O₂
• 分子量: 222.32
• InChiKey: AOQXHDOGCZXFEV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  16
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.93
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• FIELD EFFECT TRANSISTOR
  申请人：TORAY INDUSTRIES, INC.

  公开号：US20160035457A1

  公开（公告）日：2016-02-04

  There is provided a field effect transistor which comprises a gate insulating layer, a gate electrode, a semiconductor layer, a source electrode and a drain electrode. The gate insulating layer contains an organic compound that contains a silicon-carbon bond and a metal compound that contains a bond between a metal atom and an oxygen atom; and the metal atoms are contained in the gate insulating layer in an amount of 10 to 180 parts by weight with respect to 100 parts by weight of the total of carbon atoms and silicon atoms. This field effect transistor (FET) has high mobility and a low voltage of the threshold value, while being suppressed in leak current.

  提供了一种场效应晶体管，包括栅绝缘层、栅电极、半导体层、源极电极和漏极电极。栅绝缘层包含一种含有硅碳键的有机化合物和一种含有金属原子和氧原子之间键的金属化合物；金属原子在栅绝缘层中的含量为100份碳原子和硅原子的总重量中的10至180份重量。该场效应晶体管具有高迁移率和低阈值电压，同时抑制泄漏电流。
• Pattern forming method, method for manufacturing electronic device, laminate film, and composition for forming upper layer film
  申请人：FUJIFILM Corporation

  公开号：US11249395B2

  公开（公告）日：2022-02-15

  One embodiment of the present invention provides a pattern forming method including a step for forming an actinic ray-sensitive or radiation-sensitive film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition, a step for forming an upper layer film on the actinic ray-sensitive or radiation-sensitive film using a composition for forming an upper layer film, a step for exposing a laminate film including the actinic ray-sensitive or radiation-sensitive film and the upper layer film, and a step for developing the exposed laminate film using a developer including an organic solvent. The composition for forming an upper layer film contains a resin (XA), a resin (XB) containing fluorine atoms, a basic compound (XC), and a solvent (XD), and the resin (XA) is a resin not containing fluorine atoms, or in a case where the resin (XA) contains fluorine atoms, the resin (XA) is a resin having a lower content of fluorine atoms than that in the resin (XB), based on a mass.

  本发明的一个实施例提供了一种图案形成方法，包括使用感光树脂或辐射敏感树脂组合物在基底上形成感光膜或辐射敏感膜的步骤、使用用于形成上层薄膜的组合物在感光膜或辐射敏感膜上形成上层薄膜的步骤，曝光包括感光膜或辐射敏感膜和上层薄膜的层压薄膜的步骤，以及使用包括有机溶剂的显影剂显影曝光的层压薄膜的步骤。用于形成上层薄膜的组合物包含树脂 (XA)、含氟原子的树脂 (XB)、碱性化合物 (XC) 和溶剂 (XD)，并且树脂 (XA) 是不含氟原子的树脂，或者在树脂 (XA) 含有氟原子的情况下，树脂 (XA) 是氟原子含量低于树脂 (XB) 中氟原子含量的树脂（基于质量）。
• Liquid Crystal Composition, Optical Compensation Film and Liquid Crystal Display Device
  申请人：Yoshikawa Masaru

  公开号：US20090009693A1

  公开（公告）日：2009-01-08

  An optical compensation film capable of contributing to improvement in a viewing angle characteristic of a liquid crystal display device, especially an IPS mode liquid crystal display device is proposed. A composition comprises at least one onium salt, at least one rod-like liquid crystalline compound, and at least one additive capable of promoting a vertical alignment of molecules of the rod-like liquid crystalline compound at an air interface; and an optical compensation film comprising an optically anisotropic layer formed of the composition are disclosed.
• OPTICALLY-COMPENSATORY SHEET, ELLIPSOIDAL POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE
  申请人：Ichinose Tomonori

  公开号：US20090066898A1

  公开（公告）日：2009-03-12

  An optically-compensatory sheet comprises an optically anisotropic layer that comprises a liquid crystal compound, wherein the liquid crystal compound in the optically anisotropic layer has S max of 0.4 or more, in which S max is a maximum value among S 1 , S 2 and S 3 , S 1 is an alignment order parameter in a vicinity of an interface between the optically anisotropic layer and air; S 2 is an alignment order parameter in a vicinity of an interface on a side opposite to the interface between the optically anisotropic layer and air; and S 3 is an alignment order parameter in an interior of the optically anisotropic layer.
• RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING THE SAME
  申请人：YADA Yuji

  公开号：US20110223544A1

  公开（公告）日：2011-09-15

  A resist pattern coating agent includes a hydroxyl group-containing resin and a solvent. The solvent includes an alcohol shown by a following formula (1) in an amount of about 30 mass % or more, R—OH  (1) wherein R represents a branched alkyl group having 3 to 10 carbon atoms. The resist pattern coating agent is used in a resist pattern-forming method. The method includes forming a first resist pattern on a substrate using a first radiation-sensitive resin composition. The first resist pattern is treated with the resist pattern coating agent. A second resist pattern is formed on the substrate treated with the resist pattern coating agent using a second radiation-sensitive resin composition.