An improved process is provided for the preparation of the dimer, 2,2-paracyclophane, which is useful as the starting material for parylene conformal coatings used in the electronics industry for the protection of various sensitive electronic components. The process comprises optimization of the normally low yield of dimer formed by the Hofmann elimination reaction of p-methylbenzyltrimethylammonium halide by conducting the elimination reaction in the presence of dimethysulfoxide and certain reaction promoters.
提供了一种改进的工艺,用于制备二聚体2,2-对
环辛烷,该二聚体可作为用于电子工业中保护各种敏感电子元件的帕里林共形涂层的起始材料。该工艺包括通过在
二甲基亚砜和某些反应
促进剂存在下进行Hofmann消除反应形成二聚体,优化通常产率较低的二聚体的形成过程。