A fine pattern is formed using a resist material including a copolymer of a silicon-containing acrylate and an acrylate which contains a group that is eliminated by an acid, and a photo-acid generator which generates the acid upon irradiation. The polarity of the material changes after elimination of this group and becomes soluble in an aqueous alkali solution.
使用一种抗蚀材料,包括含
硅丙烯酸酯的共聚物和含有酸消除基团的
丙烯酸酯,并使用光酸发生剂进行辐照,形成一种精细的图案。该材料的极性在消除基团后发生变化,并变得可溶于
水性碱溶液。