[EN] DENDRITIC POLYMERS WITH ENHANCED AMPLIFICATION AND INTERIOR FUNCTIONALITY [FR] POLYMERES DENDRITIQUES AVEC FONCTIONNALITE INTERIEURE ET AMPLIFICATION RENFORCEES
Resist material including si-containing resist having acid removable
申请人:Fujitsu Limited
公开号:US05856071A1
公开(公告)日:1999-01-05
A fine pattern is formed using a resist material including a copolymer of a silicon-containing acrylate and an acrylate which contains a group that is eliminated by an acid, and a photo-acid generator which generates the acid upon irradiation. The polarity of the material changes after elimination of this group and becomes soluble in an aqueous alkali solution.
[EN] DENDRITIC POLYMERS WITH ENHANCED AMPLIFICATION AND INTERIOR FUNCTIONALITY<br/>[FR] POLYMERES DENDRITIQUES AVEC FONCTIONNALITE INTERIEURE ET AMPLIFICATION RENFORCEES