A chemical amplifying type positive resist composition which provides a resist pattern having an exceedingly improved line edge roughness, and is excellent in various resist performances such as dry etching resistance, sensitivity and resolution; and comprises:
(A) an acid generator containing (a) a sulfonium salt represented by the following formula (I):
1
wherein Q
1
and Q
2
is alkyl or a cycloalkyl, or Q
1
and Q
2
form, together with a sulfur atom to which Q
1
and Q
2
are adjacent, an heteroalicyclic group; Q
3
represents a hydrogen atom, Q
4
represents alkyl or a cycloalkyl, or Q
3
and Q4 form, together with a CHC(O) group to which Q
3
and Q4 are adjacent, a 2-oxocycloalkyl group; and Q
5
SO
3
−
represents an organosulfonate ion, and
(b) at least one onium salt selected from a triphenylsulfonium salt represented by the following formula (IIa), and a diphenyliodonium salt represented by the following formula (IIb);
2
wherein P
1
to P
5
represent hydrogen, a hydroxyl group, alkyl, or alkoxy; and P
6
SO
3
−
and P
7
SO
3
−
each independently represent an organosulfonate ion; and
(B) a resin which has a polymerization unit having a group instable against an acid, and is alkali-insoluble or -slightly soluble itself, but is converted to alkali-soluble by the action of an acid.
一种
化学放大型正电子抗蚀剂组合物,提供具有极大改善的线边粗糙度的抗蚀图案,并且在干法蚀刻抵抗、灵敏度和分辨率等各种抗蚀性能方面表现优异;并包括:(A)含有(a)由以下式(I)表示的烷基
磺酸盐的酸发生剂:其中Q1和Q2是烷基或环烷基,或Q1和Q2与相邻的
硫原子一起形成杂环脂肪族基;Q3代表氢原子,Q4代表烷基或环烷基,或Q3和Q4与相邻的CHC(O)基团一起形成2-氧代环烷基;以及Q5SO3-代表有机
磺酸盐离子,以及(b)至少选择一种由以下式(IIa)表示的三苯基烷基
磺酸盐和以下式(IIb)表示的
二苯基碘酸盐的烷基
磺酸盐;其中P1至P5代表氢、羟基、烷基或烷氧基;以及P6SO3-和P7SO3-各自独立地表示有机
磺酸盐离子;以及(B)具有对酸不稳定的聚合单元的
树脂,本身是碱不溶性或微溶性的,但在酸的作用下转变为碱可溶性。