申请人:CLARIANT INTERNATIONAL LTD.
公开号:EP1087260A1
公开(公告)日:2001-03-28
A radiation sensitive resin composition which contains a specific amount of a fluorescent material and has high sensitivity, high resolution, excellent highly normalized film remaining characteristics , and capability to form a good pattern. In the case that the radiation sensitive resin composition comprises at least both a resin and a photosensitive material, such as an alkali-soluble novolak resin and a quinonediazide compound, the fluorescent material is used in an amount of 0.0001 to 1.0 parts by weight relative to 100 parts by weight of the photosensitive material. In the case that the radiation sensitive resin composition comprises at least both a resin and a photoacid generator, such as a positive-working or negative-working chemically amplified resist, the fluorescent material is used in an amount of 1.0 to 30.0 parts by weight relative to 100 parts by weight of the photoacid generator. The fluorescent material to be used is an organic fluorescent material such as a naphthalene, an anthracene, a phenanthrene, a pyrene, a perylene, a fluorene, a carbazole, a biphenyl, a p-terphenyl, a p-quaterphenyl, an indole, an acridine, a naphthacene, a rublene, a chrysene, or the like.
一种辐射敏感树脂组合物,它含有一定量的荧光材料,具有高灵敏度、高分辨率、优异的高度归一化胶片剩余特性以及形成良好图案的能力。在辐射敏感树脂组合物至少包含树脂和感光材料(如碱溶性酚醛树脂和喹诺酮噻嗪化合物)的情况下,相对于 100 份感光材料,荧光材料的使用量为 0.0001 至 1.0 份(重量比)。如果辐射敏感树脂组合物至少包括树脂和光酸发生器,例如正向工作或负向工作的化 学放大抗蚀剂,则荧光材料的使用量为 1.0 至 30.0 份(按重量计),相对于 100 份(按 重量计)的光酸发生器。使用的荧光材料为有机荧光材料,如萘、蒽、菲、芘、过烯、芴、咔唑、联苯、对三联苯、对四联苯、吲哚、吖啶、萘、红萘、菊烯等。