gamma-butyrolactone methacrylate

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: gamma-butyrolactone methacrylate
• 英文别名: 2-Methylprop-2-enoic acid;oxolan-2-one
• 化学式: C₄H₆O₂*C₄H₆O₂
• 分子量: 172.181
• InChiKey: IFDUTQGPGFEDHJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.97
• 重原子数：
  12
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  63.6
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  1-乙基环戊基甲基丙烯酸酯 、 3-羟基-1-金刚烷基甲基丙烯酸酯 、 乳酸乙酯 、 二苯醚 、 丙二醇甲醚醋酸酯 、 3,5-bis(1,1,1,3,3,3-hexafluoro-2-hydroxypropan-2-yl)cyclohexyl methacrylate 、 4-diacetoxyiodobiphenyl 、 alpha-(gamma-butyrolactone) methacrylate 、 2-异丙基-2-金刚烷丙烯酸甲酯 、 gamma-butyrolactone methacrylate 、 potassium nonaflate 生成 Biphenyl-4-yl(4-phenoxyphenyl)iodonium 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
  参考文献：
  名称：

  摘要：

  DOI：

文献信息

• Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition
  申请人：Wada Kenji

  公开号：US20050123859A1

  公开（公告）日：2005-06-09

  A photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with actinic rays or a radiation; a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation; and a pattern forming method using a photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation.

  一种包含能够在受到光敏辐射或辐射照射后生成特定磺酸的化合物的光敏组合物；一种包含能够在受到光敏辐射或辐射照射后生成特定磺酸的化合物的光敏组合物；以及一种使用包含能够在受到光敏辐射或辐射照射后生成特定磺酸的化合物的光敏组合物的图案形成方法。
• Acid generating agent for chemically amplified resist compositions
  申请人：Jung Sung-Do

  公开号：US20090291390A1

  公开（公告）日：2009-11-26

  An acid generating agent represented by the following formula (1) or (2) is provided, which is included in chemically amplified resist compositions: wherein in the formula (1) and (2), X represents an unsubstituted or substituted alkyl group having 1 to 20 carbon atoms and selected from alkyl, haloalkyl and alkylsulfonyl, which may have at least one hydrogen atom substituted by an ether group, an ester group, a carbonyl group, an acetal group, a nitrile group, a cyano group, a hydroxyl group, a carboxyl group or an aldehyde group, or represents a perfluoroalkyl group having 1 to 4 carbon atoms; R 6 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a heteroatom selected from nitrogen, sulfur, fluorine and oxygen; m is an integer from 0 to 2; and A+ is an organic counterion.

  提供了以下公式（1）或（2）所代表的酸生成剂，该酸生成剂包含在化学增感抗蚀剂组成物中：在公式（1）和（2）中，X代表具有1至20个碳原子的未取代或取代的烷基基团，并且选择自烷基、卤代烷基和烷基磺酰基，该基团可能至少有一个氢原子被醚基团、酯基团、羰基团、缩醛基团、腈基团、氰基团、羟基团、羧基团或醛基团取代，或代表具有1至4个碳原子的全氟烷基基团；R6代表具有1至10个碳原子的烷基基团、具有1至10个碳原子的烷氧基团，或选择自氮、硫、氟和氧的杂原子；m为0至2的整数；A+为有机对离子。
• [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
  申请人：BASF SE

  公开号：WO2011104127A1

  公开（公告）日：2011-09-01

  The invention pertains to a compound generating an acid of the formula (I) or (II), for instance corresponding sulfonium and iodonium salts, as well as corresponding sulfonyloximes, Formula (I) and Formula (II), wherein X is CH2 or CO; Y is O, NR4, S, O(CO), O(CO)O, O(CO)NR4, OSO2, O(CS), or O(CS)NR4; R1 is for example C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1-C3-alkyl, C3-C30cycloalkyl, C3-C30cycloalkyl-C1-C18alkyl, interrupted C2-C18alkyl, interrupted C3-C30cycloalkyl, interrupted C3-C30cycloalkyl-C1-C18alkyl, interrupted C4-C30cycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, biphenylyl, fluorenyl or heteroaryl, all unsubstituted or are substituted; or R1 is NR12R13; R2 and R3 are for example C3-C30cycloalkylene, C3-C30cycloalkyl-C1-C18alkylene, C1-C18alkylene, C1-C10haloalkylene, C2-C12alkenylene, C4-C30cycloalkenylene, phenylene, naphthylene, anthracylene, phenanthrylene, biphenylene or heteroarylene; all unsubstituted or substituted; R4 is for example C3-C30cycloalkyl, C3-C30cycloalkyl-C1-C18alkyl, C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1-C3-alkyl; R12 and R13 are for example C3-C30cycloalkyl, C3-C30cycloalkyl-C1-C18alkyl, C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1-C3-alkyl, Ar, (CO)R15, (CO)OR15 or SO2R15; and Ar is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl or heteroaryl, all unsubstituted or substituted.

  该发明涉及一种生成式(I)或(II)的酸的化合物，例如相应的砜和碘砜盐，以及相应的砜酮肟，式(I)和式(II)，其中X为CH2或CO；Y为O、NR4、S、O(CO)、O(CO)O、O(CO)NR4、OSO2、O(CS)或O(CS)NR4；R1例如为C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯烃基、苯基-C1-C3-烷基、C3-C30环烷基、C3-C30环烷基-C1-C18烷基、中断的C2-C18烷基、中断的C3-C30环烷基、中断的C3-C30环烷基-C1-C18烷基、中断的C4-C30环烯烃基、苯基、萘基、蒽基、菲基、联苯基、芴基或杂环烯基，全部为未取代或取代；或R1为NR12R13；R2和R3例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯烃基、苯基、萘基、蒽基、菲基、联苯基或杂环烯基；全部为未取代或取代；R4例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯烃基、苯基-C1-C3-烷基；R12和R13例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯烃基、苯基-C1-C3-烷基、Ar、(CO)R15、(CO)OR15或SO2R15；Ar为苯基、联苯基、芴基、萘基、蒽基、菲基或杂环烯基，全部为未取代或取代。
• PHOTOACID GENERATORS
  申请人：Thackeray James W.

  公开号：US20120141939A1

  公开（公告）日：2012-06-07

  A photoacid generator compound has formula (I): G + Z − (I) wherein G has formula (II): In formula (II), X is S or I, each R 0 is commonly attached to X and is independently C 1-30 alkyl; polycyclic or monocyclic C 3-30 cycloalkyl; polycyclic or monocyclic C 6-30 aryl; or a combination comprising at least one of the foregoing groups. G has a molecular weight greater than 263.4 g/mol, or less than 263.4 g/mol. One or more R 0 groups are further attached to an adjacent R 0 group, a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 2 or 3. Z in formula (I) comprises the anion of a sulfonic acid, a sulfonimide, or a sulfonamide. A photoresist and coated film also includes the photoacid generator, and a method of forming an electronic device uses the photoresist.

  一种光酸发生剂化合物具有以下式(I)：G+Z−(I)，其中G具有以下式(II)： 在式(II)中，X为S或I，每个R0通常连接到X，并且独立地为C1-30烷基；多环或单环的C3-30环烷基；多环或单环的C6-30芳基；或包含至少其中一种上述基团的组合。G的分子量大于263.4克/摩尔，或小于263.4克/摩尔。一个或多个R0基团进一步连接到相邻的R0基团，a为2或3，其中当X为I时，a为2，或当X为S时，a为2或3。式(I)中的Z包括磺酸盐、磺酰亚胺或磺酰胺的阴离子。光阻剂和涂层膜还包括该光酸发生剂，并且形成电子器件的方法使用该光阻剂。
• PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION
  申请人：KODAMA Kunihiko

  公开号：US20080138742A1

  公开（公告）日：2008-06-12

  The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.

  本发明涉及一种在阳离子部分具有多环碳氢结构的芳基磺酸盐化合物。