Metal complexes for chemical vapour deposition of platinum
申请人:Doppelt Pascal
公开号:US08604231B2
公开(公告)日:2013-12-10
The invention relates to platinum complexes, to a method for preparing the same and to the use thereof for the chemical vapor deposition of metal platinum. The chemical vapor deposition of platinum onto a substrate is made from a platinum organo-metal compound the includes a ligand with a cyclic structure including at least two non-adjacent C═C double bonds, and the platinum organo-metal compound has a square-lane structure in which the platinum is bonded to each of the C═C double bonds of the ligand, thereby forming a (C═C)—Pt—(C═C) of 60° to 70°.