PHOTORESIST COMPOSITION, COATED SUBSTRATE INCLUDING THE PHOTORESIST COMPOSITION, AND METHOD OF FORMING ELECTRONIC DEVICE
申请人:ROHM AND HAAS ELECTRONIC MATERIALS LLC
公开号:US20170192353A1
公开(公告)日:2017-07-06
A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I):
wherein, EWG, Y, R, and M
+
are the same as described in the specification.