trimethylolpropane trivinyl ether

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: trimethylolpropane trivinyl ether
• 英文别名: Trimethylopropane trivinyl ether；1-ethenoxy-2,2-bis(ethenoxymethyl)butane
• 化学式: C₁₂H₂₀O₃
• 分子量: 212.289
• InChiKey: CZAVRNDQSIORTH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  15
• 可旋转键数：
  10
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  27.7
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  trimethylolpropane trivinyl ether 、 bis(2-phenethyl)phosphine 在 偶氮二异丁腈 作用下， 以 苯 为溶剂， 反应 72.0h， 以82%的产率得到1,1,1-tris[2-(diphenethylphosphino)ethoxymethyl]propane
  参考文献：
  名称：

  三乙烯基醚与二次膦的加氢磷酸化反应合成具有氨基和醚基的三脚架膦

  摘要：

  摘要 通过将仲膦穷尽地添加到氨基三醇的三乙烯基醚中，将一氧化氮与（和）氧原子作为其他较弱的配位位点（新的半不稳定配体）进行一锅，无原子经济，无金属和卤素的合成已开发出三醇。反应在自由基条件下进行（UV辐射或AIBN，反应物摩尔比为3：1），从而以良好或优异的收率为所有三个乙烯基氧基提供化学和区域选择性的反马尔科夫尼科夫三加合物。 通过将仲膦穷尽地添加到氨基三醇的三乙烯基醚中，将一氧化氮与（和）氧原子作为其他较弱的配位位点（新的半不稳定配体）进行一锅，无原子经济，无金属和卤素的合成已开发出三醇。反应在自由基条件下进行（UV辐射或AIBN，反应物摩尔比为3：1），从而以良好或优异的收率为所有三个乙烯基氧基提供化学和区域选择性的反马尔科夫尼科夫三加合物。

  DOI：

  10.1055/s-0033-1340497
• 作为产物：
  描述：

  三羟甲基丙烷 、 乙炔 在 二甲基亚砜 、 potassium hydroxide 作用下， 生成 trimethylolpropane trivinyl ether
  参考文献：
  名称：

  Atom-economic synthesis of highly branched functional ‘tripod-like’ triphosphine sulfides

  摘要：

  The tertiary polyfunctional triphosphine sulfides with amino and (or) ether groups have been synthesized in excellent yields by the exhaustive regioselective (in anti-Markovnikov manner) addition of secondary phosphines sulfides to trivinyl ethers of aminotriols and triols under free-radical conditions (UV-irradiation, 1.5-5 h).

  DOI：

  10.1080/17415993.2015.1007143

文献信息

• Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
  申请人：——

  公开号：US20040167322A1

  公开（公告）日：2004-08-26

  A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.

  一种化学放大型抗蚀组合物，包括在苯环上的2-位含有长链烷氧基基团的特定苯磺酰二氮甲烷，具有许多优点，包括提高分辨率，改善焦点宽度，即使在长期PED上也减少线宽变化或形状退化，涂层、显影和剥离后减少残留物，并在显影后改善图案轮廓，因此适用于微加工。
• BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20120141938A1

  公开（公告）日：2012-06-07

  A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a β-alanine, γ-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide focus margin.

  一种化学放大型光刻胶组合物，包括基础聚合物、酸发生剂和胺淬灭剂，后者为β-丙氨酸、γ-氨基丁酸或5-氨基戊酸的衍生物，具有一个被酸不稳定基团所取代的羧基，这种组合物在曝光前后具有高对比度的碱性溶解速率，并且能够形成高分辨率、最小粗糙度和宽焦深度的良好图案轮廓。
• Active ray curable ink-jet composition, image forming method using the same, ink-jet recording apparatus, and triarylsulfonium salt compound
  申请人：KONICA MINOLTA MEDICAL & GRAPHIC, INC.

  公开号：US20040244641A1

  公开（公告）日：2004-12-09

  An active ray curable ink-jet ink composition comprising a photo-induced acid generating agent containing an onium salt which does not generate benzene under active ray radiation, and a photopolymerizable compound containing a compound having an oxetane ring in the molecule.

  一种活性紫外光固化喷墨墨水组合物，包括含有不在活性紫外光辐射下生成苯的光诱导酸发生剂的盐类和含有分子中含有氧杂环戊烷环的光聚合化合物。
• NOVOLAC RESIN AND RESIST FILM
  申请人：DIC Corporation

  公开号：US20180334523A1

  公开（公告）日：2018-11-22

  Provided are a novolac resin having developability, heat resistance, and dry etching resistance, and a photosensitive composition, a curable composition, and a resist film. A novolac resin including, as a repeating unit, a structural moiety represented by Structural Formula (1) or (2): (in the formula, Ar represents an arylene group, R 1 's each independently represent any one of a hydrogen atom, an alkyl group, an alkoxy group, and a halogen atom, m's each independently represent an integer of 1 to 3, and X is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group) in which at least one of X's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group.

  提供一种具有可开发性、耐热性和干法蚀刻抗性的新戊醛树脂，以及一种光敏组合物、可固化组合物和抗蚀膜。一种新戊醛树脂包括以下结构单元： （在公式中，Ar代表芳基，R 1 分别独立地代表氢原子、烷基、烷氧基和卤素原子中的任意一种，m分别独立地代表1至3的整数，X代表氢原子、三级烷基、烷氧基烷基、酰基、烷氧羰基、含杂原子的环烃基和三烷基硅基中的任意一种），树脂中至少有一个X是三级烷基、烷氧基烷基、酰基、烷氧羰基、含杂原子的环烃基和三烷基硅基中的任意一种。
• COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING THE COMPOUND OR RESIN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20170073288A1

  公开（公告）日：2017-03-16

  The compound according to the present invention is represented by a specific formula. The compound according to the present invention has a structure according to the specific formula, and therefore can be applied to a wet process and is excellent in heat resistance and etching resistance. In addition, the compound according to the present invention has such a specific structure, and therefore has a high heat resistance, a relatively high carbon concentration, a relatively low oxygen concentration and also a high solvent solubility. Therefore, the compound according to the present invention can be used to form an underlayer film whose degradation is suppressed at high-temperature baking and which is also excellent in etching resistance to oxygen plasma etching or the like. Furthermore, the compound is also excellent in adhesiveness with a resist layer and therefore can form an excellent resist pattern.

  根据本发明，该化合物由特定的公式表示。根据本发明，该化合物具有特定公式的结构，因此可应用于湿法工艺，具有优异的耐热性和耐蚀性。此外，根据本发明，该化合物具有特定结构，因此具有高耐热性、相对较高的碳浓度、相对较低的氧浓度以及高溶剂溶解性。因此，根据本发明的化合物可用于形成在高温烘烤时降解受抑制且在氧等离子体蚀刻中具有优异耐蚀性的底层膜。此外，该化合物在与光阻层的粘附性方面也表现出色，因此可形成优异的光阻图案。