申请人:International Business Machines Corporation
公开号:US20180044459A1
公开(公告)日:2018-02-15
Non-ionic photo-acid generating (PAG) polymerizable monomers were prepared that contain a side chain sulfonate ester of an alpha-hydroxy aryl ketone. The aryl ketone group has a perfluorinated substituent alpha to the ketone carbonyl. The sulfur of the sulfonate ester is also directly linked to a fluorinated group. PAG polymers prepared from the PAG monomers release a strong sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development.
制备了含有α-羟基芳基酮的侧链磺酸酯的非离子光酸发生(PAG)可聚合单体。芳基酮基团在酮基团的α位有全氟取代基。磺酸酯的硫也直接连接到氟化基团。从这些PAG单体制备的PAG聚合物在暴露于高能辐射(如深紫外或极紫外光)时释放出强磺酸。在经过后曝光烘烤(PEB)处理(100°C至150°C)的暴露光刻胶层中,光生成的磺酸扩散速率较低,结果在显影后形成良好的线型图案。