1,1-双(三氟甲基)-1-戊醇 | 10482-99-2

• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: 1,1-双(三氟甲基)-1-戊醇
• 英文名称: 1,1-bis(trifluoromethyl)-1-pentanol
• 英文别名: 1,1-Bis-(trifluormethyl)-pentan-1-ol；1,1,1-trifluoro-2-trifluoromethyl-hexan-2-ol；1,1,1-Trifluoro-2-(trifluoromethyl)hexan-2-ol
• CAS: 10482-99-2
• 化学式: C₇H₁₀F₆O
• 分子量: 224.146
• InChiKey: OFCORODKLXXJAN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.4
• 重原子数：
  14
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  7

反应信息

• 作为反应物：
  描述：

  1,1-双(三氟甲基)-1-戊醇 在 三氯化铝 sodium hydride 作用下， 以 乙醚 为溶剂， 反应 17.0h， 生成 2,4,6-tris(1,1-bis(trifluoromethyl)-1-pentoxy)-s-triazine
  参考文献：
  名称：

  Synthesis and trimerization of fluorinated tertiary cyanates

  摘要：

  DOI：

  10.1016/s0022-1139(00)85224-0
• 作为产物：
  描述：

  正丁基锂 、 六氟丙酮 以31%的产率得到1,1-双(三氟甲基)-1-戊醇
  参考文献：
  名称：

  Synthesis and trimerization of fluorinated tertiary cyanates

  摘要：

  DOI：

  10.1016/s0022-1139(00)85224-0

文献信息

• Control Factors of Two Reaction Modes of Pentacoordinate 1,2-Oxasiletanides, the Peterson Reaction and Homo-Brook Rearrangement
  作者：Kenji Naganuma、Takayuki Kawashima、Renji Okazaki

  DOI：10.1246/cl.1999.1139

  日期：1999.11

  Thermolyses of pentacoordinate 1,2-oxasiletanides with or without a neopentyl group at the 3-position in the presence of a proton source afforded the corresponding olefin and/or alcohol, indicating that they are the intermediates of both the Peterson reaction and homo-Brook rearrangement which are two possible modes in the reaction of β-hydroxyalkylsilanes with bases.

  在质子源存在下，在 3 位带有或不带有新戊基的五配位 1,2-oxasiletanides 的热解得到相应的烯烃和/或醇，表明它们是彼得森反应和均-布鲁克反应的中间体重排是 β-羟烷基硅烷与碱反应的两种可能模式。
• Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same
  申请人：Central Glass Company, Limited

  公开号：US20150198879A1

  公开（公告）日：2015-07-16

  Disclosed is a fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3). In the formula, each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and n represents an integer of 1-10. W represents a bivalent linking group, R 01 represents a hydrogen atom or a monovalent organic group, and M + represents a monovalent cation. A resist composition containing this resin is further superior in sensitivity, resolution and reproducibility of mask pattern and is capable of forming a pattern with a low LER.

  本公开了一种含氟磺酸盐树脂，其具有以下通用式（3）所代表的重复单元。在该式中，每个A独立地表示氢原子、氟原子或三氟甲基基团，n表示1-10的整数。W表示二价连接基团，R01表示氢原子或一价有机基团，M+表示一价阳离子。含有该树脂的抗蚀组合物在感光性、分辨率和掩膜图案的重现性方面更加优越，并且能够形成具有较低LER的图案。
• Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method
  申请人：Mori Kazunori

  公开号：US20120077126A1

  公开（公告）日：2012-03-29

  A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, R 1 represents a polymerizable double bond-containing group; R 2 represents a fluorine atom or a fluorine-containing alkyl group; R 8 represents a substituted or unsubstituted alkyl group or the like; and W 1 represents a single bond, a substituted or unsubstituted methylene group or the like.

  本发明的含氟聚合物包含通式（2）的重复单元（a），其具有1,000至1,000,000的质量平均分子量。该聚合物适用于抗高能辐射（波长小于或等于300nm的高能射线辐射或电子束辐射）的光阻组合物，或用于液体浸没光刻的面涂层组合物，并具有高水珠性，尤其是高后退接触角。在公式中，R1表示可聚合的双键含有的基团；R2表示氟原子或含氟烷基；R8表示取代或未取代的烷基或类似物；W1表示单键，取代或未取代的亚甲基或类似物。
• Photoactive polymer brush materials and EUV patterning using the same
  申请人：International Business Machines Corporation

  公开号：US10831102B2

  公开（公告）日：2020-11-10

  Photoactive polymer brush materials and methods for EUV photoresist patterning using the photoactive polymer brush materials are described. The photoactive polymer brush material incorporates a grafting moiety that can be immobilized at the substrate surface, a dry developable or ashable moiety, and a photoacid generator moiety, which are bound to a polymeric backbone. The photoacid generator moiety generates an acid upon exposure to EUV radiation acid at the interface, which overcomes the acid depletion problem to reduce photoresist scumming. The photoacid generator moiety can also facilitate cleavage of the photoactive polymer brush material from the substrate via an optional acid cleavable grafting functionality for the grafting moiety. The dry developable or ashable moiety facilitates complete removal of the photoactive brush material from the substrate in the event there is residue present subsequent to development of the chemically amplified EUV photoresist.

  本文介绍了光活性聚合物刷材料以及使用光活性聚合物刷材料进行 EUV 光刻胶图案化的方法。光活性聚合物刷材料包含一个可固定在基底表面的接枝分子、一个可干显影或可灰化的分子和一个光酸发生器分子，它们与聚合物骨架结合在一起。光酸发生器分子在界面上暴露于 EUV 辐射酸时产生一种酸，从而克服了酸耗竭问题，减少光刻胶浮渣。光酸发生器分子还可以通过接枝分子可选的酸裂解接枝官能团，促进光活性聚合物刷材料从基底上裂解。在化学放大 EUV 光刻胶显影后，如果存在残留物，干显影或可灰化的分子有助于将光活性刷材料从基底上完全清除。
• Metallation of N,N-Dimethylaniline^1a
  作者：Arthur R. Lepley、Wajid A. Khan、Armida B. Giumanini、Angelo G. Giumanini

  DOI：10.1021/jo01345a001

  日期：1966.7