1-dibromo-2-vinylcyclopropane derivatives with MeLi yielded cyclopentadienes as the main products together with small amounts of allenic compounds (Table 1). By the same reaction 2,2,2′,2′-tetrabromobicyclopropyl derivatives yielded, in all but one case, only small amounts of diallenes; the exception is the exclusive formation of 2,7-dimethyl-2,3,5,6-octatetraene, (XIII) from2,2,2′,2′-tetrabromo-3,3,3′,
Substitution in the cyclopentadienide anion series
作者:S. McLean、P. Haynes
DOI:10.1016/s0040-4020(01)93886-4
日期:1965.1
It is shown that the cyclopentadienide anion can undergo an electrophilic substitution. In methylation reactions it was possible to stop the reaction at the intermediate 5-substituted cyclopentadiene stage. In the methylcyclopentadienide anion, the methyl group directs an electrophile to the adjacent carbon atom.
Bis(di-, tri- or tetra-substituted-cyclopentadienyl)-zirconium dihalides
申请人:Chisso Corporation
公开号:US04874880A1
公开(公告)日:1989-10-17
Bis(di-, tri- or tetra-substituted-cyclopentadienyl)zirconium dihalides represented by the following general formula [I] are provided, ##STR1## (wherein R.sup.1 denotes a substituent group on the cyclopentadienyl ring which is an alkyl radical of 1 to 5 carbon atoms; R.sub.2.sup.1 --C.sub.5 H.sub.3 stands for a di-substituted cyclopentadienyl radical; and X is a halogen atom). This compound, when combined with an aluminoxane repesented by the following general formula [VII], gives a high-activity catalyst for the synthesis of polyolefins, ##STR2## (wherein m is an integer of 4 to 20; and R.sup.2 denotes a hydrocarbyl radical).
GROUP IV ELEMENT CONTAINING PRECURSORS AND DEPOSITION OF GROUP IV ELEMENT CONTAINING FILMS
申请人:L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
公开号:US20220205099A1
公开(公告)日:2022-06-30
A method for forming a Group IV transition metal containing film comprises
a) exposing a substrate to a vapor of a Group IV transition metal containing film forming composition;
b) exposing the substrate to a co-reactant; and
c) repeating the steps of a) and b) until a desired thickness of the Group IV transition metal containing film is deposited on the substrate using a vapor deposition process,
一种制备含有IV族过渡金属薄膜的方法包括以下步骤:
a) 将基板暴露在IV族过渡金属含有的薄膜形成组合物的蒸汽中;
b) 将基板暴露在共同反应物中;
c) 重复步骤a)和b),直到使用蒸汽沉积工艺在基板上沉积所需厚度的IV族过渡金属含有的薄膜。
Holm, K.H.; Skatteboel, L., Acta chemica Scandinavica. Series B: Organic chemistry and biochemistry, 1985, vol. 39, # 7, p. 549 - 562