9-pentylaminoacridine | 74054-22-1

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 喹啉及其衍生物
• 英文名称: 9-pentylaminoacridine
• 英文别名: N-pentyl-9-Acridinamine；9-Acridinamine, N-pentyl-；N-pentylacridin-9-amine
• CAS: 74054-22-1
• 化学式: C₁₈H₂₀N₂
• 分子量: 264.37
• InChiKey: XYIKWCPPWRQYGA-UHFFFAOYSA-N

物化性质

• 沸点：
  439.3±20.0 °C(Predicted)
• 密度：
  1.118±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  5.3
• 重原子数：
  20
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.28
• 拓扑面积：
  24.9
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  N-苯基邻氨基苯甲酸 在 三氯氧磷 作用下， 以 苯酚 为溶剂， 反应 1.0h， 生成 9-pentylaminoacridine
  参考文献：
  名称：

  Synthesis and evaluation of N-alkyl-9-aminoacridines with antibacterial activity

  摘要：

  A series of 9-alkylaminoacridines were synthesized and evaluated for activity against two strains of methicillin-resistant and one strain of methicillin-sensitive Staphylococcus aureus. Results are presented that show a clear structure activity relationship between the N-alkyl chain length and antibacterial activity with peak MIC99 values of 2-3 mu M for alkyl chains ranging from 10 to 14 carbons in length. Although prior work has linked the function of acridine-based compounds to intercalation and topoisomerase inhibition, the present results show that 9-alkylaminoacridines likely function as amphiphilic membrane-active disruptors potentially in a similar manner as quaternary ammonium antimicrobials. (C) 2014 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.bmcl.2014.05.037

文献信息

• Photosensitive element, laminate, permanent mask resist, method for producing same, and method for producing semiconductor package
  申请人：HITACHI CHEMICAL COMPANY, LTD.

  公开号：US11054744B2

  公开（公告）日：2021-07-06

  Provided is a photosensitive element including a support film, and a photosensitive layer provided on the support film and formed from a photosensitive resin composition, in which the surface roughness of the surface of the support film that is in contact with the photosensitive layer is 200 to 4,000 nm.

  本发明提供了一种光敏元件，包括支撑膜和设置在支撑膜上并由光敏树脂组合物形成的光敏层，其中与光敏层接触的支撑膜表面的粗糙度为 200 至 4,000 nm。
• Galy, Jean Pierre; Elguero, Jose; Vincent, Emile Jean, Heterocycles, 1980, vol. 14, # 3, p. 311 - 313
  作者：Galy, Jean Pierre、Elguero, Jose、Vincent, Emile Jean

  DOI：——

  日期：——
• Assays employing novel substrates for measuring P450-mediated N-dealkylation
  申请人：Mayer E. Gabriele

  公开号：US20070015235A1

  公开（公告）日：2007-01-18

  Methods and compositions for measuring N-dealkylating activity of cytochromes P450 enyzmes are disclosed.
• POLYACRIDINE NUCLEIC ACID DELIVERY PEPTIDE COMPLEXES
  申请人：Rice Kevin G.

  公开号：US20120035320A1

  公开（公告）日：2012-02-09

  The present invention provides nucleic acid delivery polyplex complexes and anionic open polyplexes comprising a nucleic acid molecule reversibly bound to one or more of nucleic acid delivery polyplex complexes.
• PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE FILM, PERMANENT RESIST AND METHOD FOR PRODUCING PERMANENT RESIST
  申请人：Nagoshi Toshimasa

  公开号：US20140154628A1

  公开（公告）日：2014-06-05

  The present invention provides a photosensitive resin composition comprising an (a) component: an acid-modified epoxy resin, a (b) component: a photopolymerizable monomer having an ethylenically unsaturated group, a (c) component: a photopolymerization initiator, a (d) component: an epoxy resin, and an (e) component: an inorganic filler, wherein the (a) component comprises an acid-modified bisphenol novolak type epoxy resin and further the photosensitive resin composition satisfies a predetermined condition, and provides a photosensitive film, a permanent resist and a method for producing a permanent resist using the same.