2,4,5,7-Tetramethyloctan-4,5-diol | 872804-70-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2,4,5,7-Tetramethyloctan-4,5-diol
• 英文别名: 2,4,5,7-tetramethyl-octane-4,5-diol；α.α'-Dimethyl-α.α'-diisobutyl-aethylenglykol；2,4,5,7-Tetramethyloctane-4,5-diol；2,4,5,7-tetramethyloctane-4,5-diol
• CAS: 872804-70-1
• 化学式: C₁₂H₂₆O₂
• 分子量: 202.337
• InChiKey: KONWMYXIZWOBTP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  14
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  2,4,5,7-Tetramethyloctan-4,5-diol 在 戊醇 、 氢碘酸 、 溶剂黄146 作用下， 生成 2-iodo-4-methylpentane
  参考文献：
  名称：

  Clarke; Shreve, American Chemical Journal, 1906, vol. 35, p. 515

  摘要：

  DOI：
• 作为产物：
  描述：

  2-异丙基乙酰乙酸乙酯 在 氢氧化钾 、 乙醚 、 水 、 sodium 作用下， 生成 2,4,5,7-Tetramethyloctan-4,5-diol
  参考文献：
  名称：

  Clarke; Shreve, American Chemical Journal, 1906, vol. 35, p. 515

  摘要：

  DOI：

文献信息

• Birkhofer, Hermann; Beckhaus, Hans-Dieter; Ruechardt, Christoph, Chemische Berichte, 1993, vol. 126, # 4, p. 1023 - 1030
  作者：Birkhofer, Hermann、Beckhaus, Hans-Dieter、Ruechardt, Christoph

  DOI：——

  日期：——
• Kolobielski, Annales de Chimie (Cachan, France), 1955, vol. <12>10, p. 271,287, 309
  作者：Kolobielski

  DOI：——

  日期：——
• Recording liquids
  申请人：Kluge Michael

  公开号：US20070157849A1

  公开（公告）日：2007-07-12

  Aqueous recording fluids comprise (a) at least one colorant which is not completely polymer enveloped, (b) at least two wetting agents selected from alkoxylated alcohols, alkoxylated acetylene alcohols, alkoxylated or nonalkoxylated acetylenediols, alkylpolyglucosides, sugar ester alkoxylates, fluorosurfactants, anionic surfactants and cationic surfactants.
• DISPERSIONS OF POLYURETHANES, THEIR PREPARATION AND USE
  申请人：Tuerk Holger

  公开号：US20100075115A1

  公开（公告）日：2010-03-25

  The present invention provides aqueous dispersions comprising a pigment (B) at least partially enveloped by polyurethane (A) and further comprising at least one polymerization inhibitor (C), said polyurethane (A) being obtainable by reaction of (a) 15% to 70% by weight of di- or polyisocyanate comprising on average from 1 to 10 allophanate groups and on average from 1 to 10 C—C double bonds per molecule, and optionally (b) 0% to 60% by weight of further di- or polyisocyanate, with (c) 5% to 50% by weight of compound having at least two isocyanate-reactive groups, weight % ages being based on total polyurethane (A).
• CMP COMPOSITIONS AND METHODS FOR SUPPRESSING POLYSILICON REMOVAL RATES
  申请人：Moeggenborg Kevin

  公开号：US20120094489A1

  公开（公告）日：2012-04-19

  The present invention provides a chemical-mechanical polishing (CMP) composition suitable for polishing a silicon nitride-containing substrate while suppressing polysilicon removal from the substrate. The composition comprises abrasive particles suspended in an acidic aqueous carrier containing a surfactant comprising an alkyne-diol, an alkyne diol ethoxylate, or a combination thereof. Methods of polishing a semiconductor substrate therewith are also disclosed.