申请人:Warner-Lambert Company
公开号:US03931230A1
公开(公告)日:1976-01-06
The present invention concerns compounds of Formula I ##SPC1## wherein R.sub.1 is hydrogen, lower alkyl, aralkyl; R.sub.2 is hydrogen, lower alkyl, lower alkoxy, halogen, trifluoromethyl, cyano, nitro, and the like; R.sub.3 is lower alkyl; ##EQU1## (where R.sub.4 and R.sub.5 are lower alkyl), ##EQU2## (where R.sub.6 is hydrogen, lower alkyl, aryl, acetamido and R.sub.7 is lower alkyl), ##SPC2## (where R.sub.8 and R.sub.9 are hydrogen or lower alkyl), --CH(SO.sub.2 C.sub.6 H.sub.5).sub.2, ##SPC3## ##EQU3## (where R.sub.10 is hydrogen, CN, acyl), ##EQU4## (where R.sub.11 and R.sub.12 are lower alkyl), --SO.sub.2 C.sub.6 H.sub.5, --CONH.sub.2, --CO.sub.2 R.sub.13 (where R.sub.13 is lower alkyl), ##EQU5## (R.sub.14 and R.sub.15 are lower alkyl). These compounds are useful as sedatives and antiaggression agents.
本发明涉及式I的化合物
其中R1是氢、低碳基、芳基甲基;R2是氢、低碳基、低烷氧基、卤素、三氟甲基、氰基、硝基等;R3是低碳基;
其中,R4和R5是低碳基的情况下,##EQU1##;
其中,R6是氢、低碳基、芳基、乙酰胺基,R7是低碳基的情况下,##EQU2##;
其中,R8和R9是氢或低碳基的情况下,##SPC2##;
其中,R10是氢、CN、酰基的情况下,##EQU3##;
其中,R11和R12是低碳基的情况下,##EQU4##;
其中,--CH(SO.sub.2 C.sub.6 H.sub.5).sub.2,##SPC3##;
其中,R13是低碳基的情况下,--CO.sub.2 R.sub.13;
其中,R14和R15是低碳基的情况下,##EQU5##。这些化合物可用作镇静剂和抗攻击剂。