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2-甲基-1-金刚烷醇 | 24557-02-6

中文名称
2-甲基-1-金刚烷醇
中文别名
——
英文名称
2-methyl-1-adamantanol
英文别名
2-methyladamantanol;2-methyladamantan-1-ol
2-甲基-1-金刚烷醇化学式
CAS
24557-02-6
化学式
C11H18O
mdl
——
分子量
166.263
InChiKey
OXHVCLNCFNQWON-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 熔点:
    211-213 °C
  • 沸点:
    253.4±8.0 °C(Predicted)
  • 密度:
    1.099±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    2.7
  • 重原子数:
    12
  • 可旋转键数:
    0
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    20.2
  • 氢给体数:
    1
  • 氢受体数:
    1

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

点击查看最新优质反应信息

文献信息

  • Process for Producing 2-Methyladamantan-2-Yl (Meth)Acrylate and 2-Methyladamantan-2-Yl (Meth)Acrylate
    申请人:Hashimoto Hidekichi
    公开号:US20080051597A1
    公开(公告)日:2008-02-28
    An object of the present invention is to provide a process for purifying 2-methyladamantan-2-yl(meth)acrylate with high separation efficiency and an industrially advantageous preparation process of 2-methyladamantan-2-yl(meth)acrylate. The present invention pertains to a preparation process of 2-methyladamantan-2-yl(meth)acrylate which comprises reacting 2-methyleneadamantane and (meth)acrylic acid by an acid catalyst to obtain a reaction mixture, and then separating 2-methyleneadamantane from the reaction mixture to obtain 2-methyladamantan-2-yl(meth)acrylate, wherein the reaction mixture is distilled in the presence of an organic compound having a boiling point, under atmospheric pressure, of 150° C. or greater but not greater than 260° C.
    本发明的一个目的是提供一种用高分离效率纯化2-甲基孔蚊烷基丙烯酸酯的工艺以及一种具有工业优势的2-甲基孔蚊烷基丙烯酸酯的制备工艺。本发明涉及一种2-甲基孔蚊烷基丙烯酸酯的制备工艺,包括通过酸催化剂使2-亚甲基孔蚊烷和(甲)丙烯酸反应以获得反应混合物,然后从反应混合物中分离出2-亚甲基孔蚊烷以获得2-甲基孔蚊烷基丙烯酸酯,其中在大气压下,在有沸点的有机化合物的存在下,将反应混合物蒸馏,其沸点大于或等于150摄氏度但不大于260摄氏度。
  • Methods for Producing Nitroso Compound and Quinoxaline Compound
    申请人:Kumiai Chemical Industry Co., Ltd.
    公开号:US20210253539A1
    公开(公告)日:2021-08-19
    A method for producing a nitroso compound of the following formula (3), comprising reacting a compound of the following formula (1) with a compound of the following formula (2) by using a tertiary alcohol and a base. wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , and R 9 are each independently a hydrogen atom, a halogen atom, a (C1-C4) alkyl, or a (C1-C4) alkoxy.
    一种制备以下化学式(3)的亚硝基化合物的方法,包括通过使用三级醇和碱将以下化学式(1)的化合物与以下化学式(2)的化合物反应。其中R1、R2、R3、R4、R5、R6、R7、R8和R9分别独立地是氢原子、卤素原子、(C1-C4)烷基或(C1-C4)烷氧基。
  • Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same
    申请人:Takemoto Ichiki
    公开号:US20050266351A1
    公开(公告)日:2005-12-01
    The present invention provides a chemically amplified positive resist composition comprising (A) a resin which comprises (i) a structural unit of the formula (I) and (ii) at least one structural unit selected from the group consisting of structural units of the formulas (II), (III), (IV) and (V) and (B) an acid generator. The present invention further provides a novel monomers useful for the resist composition, and process for the monomers and the compositions.
    本发明提供了一种化学增感正性光阻组合物,包括(A)树脂,该树脂包括(i)公式(I)的结构单元和(ii)选自结构单元组的至少一个结构单元,所述结构单元组包括公式(II)、(III)、(IV)和(V)的结构单元,以及(B)酸发生剂。本发明还提供了一种新型单体,可用于制备光阻组合物,以及单体和组合物的制备方法。
  • Radiation-sensitive resin composition
    申请人:——
    公开号:US20030219680A1
    公开(公告)日:2003-11-27
    A radiation-sensitive resin composition suitable as a chemically-amplified resist is provided. The composition comprised (A) a resin insoluble or scarcely soluble in alkali, but becoming alkali soluble by the action of an acid, and (B) a photoacid generator. The resin comprises a recurring unit of the following formula (I), 1 wherein R 1 is typically a hydrogen atom and the —C (R 5 ) 3 structure is a 2-methyl-2-tricyclodecanyl group, 2-ethyl-2-tricyclodecanyl group, 2-methyl-2-adamantyl group, 2-ethyl-2-adamantyl group, 1-methylcyclopentyl group, 1-ethylcyclopentyl group, 1-methylcyclohexyl group, or 1-ethylcyclohexyl group.
    提供一种适用于化学放大光刻胶的辐射敏感树脂组合物。该组合物包含(A)一种碱不溶或难溶的树脂,但在酸的作用下变得碱溶,以及(B)一种光酸发生剂。该树脂包含以下式(I)的重复单元,其中R1通常是氢原子,而—C(R5)3结构是2-甲基-2-三环己基基团、2-乙基-2-三环己基基团、2-甲基-2-金刚烷基团、2-乙基-2-金刚烷基团、1-甲基环戊基团、1-乙基环戊基团、1-甲基环己基团或1-乙基环己基团。
  • Organic Bismuth Compound, Method for Producing Same, Living Radical Polymerization Initiator, Method for Producing Polymer Using Same, and Polymer
    申请人:Yamago Shigeru
    公开号:US20070265404A1
    公开(公告)日:2007-11-15
    An organobismuth compound represented by the formula (1) wherein R 1 and R 2 are C 1 -C 8 alkyl, aryl, substituted aryl or an aromatic heterocyclic group, R 3 and R 4 are each a hydrogen atom or C 1 -C 8 alkyl, and R 5 is aryl, substituted aryl, an aromatic heterocyclic group, acyl, amido, oxycarbonyl or cyano.
    一种有机铋化合物,其化学式为(1),其中R1和R2为C1-C8烷基、芳基、取代芳基或芳香族杂环基,R3和R4分别为氢原子或C1-C8烷基,R5为芳基、取代芳基、芳香族杂环基、酰基、酰胺基、氧羰基或氰基。
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