2-甲基双环[2.2.1]庚烷-3-羧酸 | 41476-87-3

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 中文名称: 2-甲基双环[2.2.1]庚烷-3-羧酸
• 英文名称: Bicyclo[2.2.1]heptane-2-carboxylic acid, 3-methyl-
• 英文别名: 3-methylbicyclo[2.2.1]heptane-2-carboxylic acid
• CAS: 41476-87-3；41476-91-9
• 化学式: C₉H₁₄O₂
• 分子量: 154.21
• InChiKey: YZBOGUZXKOTDJI-UHFFFAOYSA-N

物化性质

• 熔点：
  68-69 °C
• 沸点：
  249.7±8.0 °C(Predicted)
• 密度：
  1.121±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  11
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

文献信息

• FLUOROALCOHOL, FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：HASEGAWA Koji

  公开号：US20120077121A1

  公开（公告）日：2012-03-29

  Fluoroalcohol compounds of formula (1) are useful in producing polymers which are used as the base resin to formulate radiation-sensitive resist compositions having transparency to radiation having a wavelength of up to 500 nm and improved development characteristics. R 1 is hydrogen or a monovalent C 1 -C 20 hydrocarbon group in which any constituent —CH 2 — moiety may be replaced by —O— or —C(═O)—, Aa is a (k 1 +1)-valent C 1 -C 20 hydrocarbon or fluorinated hydrocarbon group, and k 1 is 1, 2 or 3.

  公式（1）的氟醇化合物在生产用作基础树脂的聚合物方面很有用，这些聚合物用于配制对波长高达500纳米的辐射具有透明性和改进的开发特性的辐射敏感型光刻胶组合物。R1是氢或一价的C1-C20碳氢基团，在其中任何成分的—CH2—基团可以被—O—或—C(═O)—替代，Aa是(k1+1)-价的C1-C20碳氢基团或氟化碳氢基团，k1为1、2或3。
• SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Sagehashi Masayoshi

  公开号：US20120100486A1

  公开（公告）日：2012-04-26

  A sulfonium salt of a naphthyltetrahydrothiophenium cation having a fluoroalkoxy chain with a specific anion is provided. The sulfonium salt is used as a photoacid generator to form a resist composition which when processed by immersion lithography, offers advantages of restrained dissolution in the immersion water and less pattern dependence or dark/bright bias.

  提供了一种具有氟烷氧链的萘基四氢噻吩阳离子的磺酸盐，具有特定阴离子。该磺酸盐用作光酸发生剂，形成抗蚀剂组合物，当通过浸没光刻法处理时，提供了在浸没水中受抑制的溶解和更少的图案依赖性或暗/亮偏差的优点。
• NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME
  申请人：OHASHI Masaki

  公开号：US20100209827A1

  公开（公告）日：2010-08-19

  There is disclosed a sulfonate shown by the following general formula (2). R 1 —COOC(CF 3 ) 2 —CH 2 SO 3 − M + (2) (In the formula, R 1 represents a linear, a branched, or a cyclic monovalent hydrocarbon group having 1 to 50 carbon atoms optionally containing a hetero atom. M + represents a cation.) There can be provided: a novel sulfonate which is effective for a chemically amplified resist composition having a sufficiently high solubility (compatibility) in a resist solvent and a resin, a good storage stability, a PED stability, a further wider depth of focus, a good sensitivity, in particular a high resolution and a good pattern profile form; a photosensitive acid generator; a resist composition using this; a photomask blank, and a patterning process.

  本发明揭示了一种磺酸盐，其通式如下（2）所示。 R1-COOC（CF3）2-CH2SO3-M+（2）（其中，R1表示具有1至50个碳原子的线性、分支或环状单价碳氢基团，可选含有杂原子。M+表示一个阳离子）。本发明可以提供：一种新型磺酸盐，其在抗蚀剂溶剂和树脂中具有足够高的溶解度（相容性），良好的储存稳定性，PED稳定性，进一步扩大焦点深度，良好的灵敏度，特别是高分辨率和良好的图案轮廓形态；一种光敏酸发生剂；使用该组合物的抗蚀剂组合物；一种光掩膜空白，以及一种制图工艺。
• NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Sagehashi Masayoshi

  公开号：US20120183904A1

  公开（公告）日：2012-07-19

  A chemically amplified positive resist composition of better performance can be formulated using a polymer having a quencher incorporated therein, specifically a polymer comprising recurring units having a carbamate structure which is decomposed with an acid to generate an amino group and optionally recurring units having an acid labile group capable of generating a carboxyl and/or hydroxyl group under the action of an acid. The polymer is highly effective for suppressing diffusion of acid and diffuses little itself, and the composition forms a pattern of rectangular profile at a high resolution.

  一种化学增感正向光阻组合物可以使用具有淬灭剂的聚合物制备，具体来说，该聚合物包含具有碳酸酯结构的重复单元，该碳酸酯结构在酸的作用下分解生成氨基团，并且可以包含具有酸敏感基团的重复单元，该酸敏感基团在酸的作用下能够生成羧基和/或羟基团。该聚合物对于抑制酸的扩散非常有效，并且本身扩散很少，组合物形成高分辨率的矩形剖面图案。
• Novel photoacid generator, resist composition, and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2105794A1

  公开（公告）日：2009-09-30

  Photoacid generators generate sulfonic acids of formula (1a) upon exposure to high-energy radiation.         ROC(=O)R1-COOCH2CF2SO3- H+     (1a) RO is OH or C1-C20 organoxy, R1 is a divalent C1-C20 aliphatic group or forms a cyclic structure with RO. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.

  光酸发生器在受到高能辐射后会生成式 (1a) 的磺酸。 ROC(=O)R1-COOCH2CF2SO3- H+ (1a) RO 是 OH 或 C1-C20 有机氧基，R1 是二价 C1-C20 脂肪族基团或与 RO 形成环状结构。光酸发生器与树脂兼容，可以控制酸扩散，因此适合用于化学放大抗蚀剂组合物。