(METH)ACRYLATE COMPOUND, (METH)ACRYLIC COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME
申请人:MITSUBISHI GAS CHEMICAL COMPANY, INC.
公开号:US20160347896A1
公开(公告)日:2016-12-01
The present invention provides a resist or a compound for use as a resist, which is highly sensitive and well-balanced without losing the fundamental physical properties required as a chemically amplified resist (e.g., resolution, line edge roughness (LER)).
The present invention is directed to a (meth)acrylate compound represented by general formula (1) and a process for preparation thereof, as well as a (meth)acrylic copolymer obtainable by polymerization of the (meth)acrylate compound of general formula (1) and a photosensitive resin composition thereof:
(wherein R
1
represents a hydrogen atom or a methyl group, R
2
represents a linear or branched alkyl group containing 2 to 4 carbon atoms, and each R
3
may be the same or different and represents a group represented by the following formula (2) or (3), etc.)
(provided that formulae (2) and (3) are as defined in the specification of the present application).