[EN] DOUBLE-DEPROTECTED CHEMICALLY AMPLIFIED PHOTORESISTS<br/>[FR] RÉSINES PHOTOSENSIBLES CHIMIQUEMENT AMPLIFIÉES ET DOUBLEMENT DÉPROTÉGÉES
申请人:UNIV NEW YORK STATE RES FOUND
公开号:WO2016161067A1
公开(公告)日:2016-10-06
There are disclosed compositions requiring two acid-catalyzed steps for deprotection. The compositions are of formula I or formula II. Also disclosed are polymers formed from these compositions, and methods of using these compositions in, for example,photolithography.