tetrahydro-3,5-methano-cyclopenta[b]furan-2,6-dione | 16479-73-5

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: tetrahydro-3,5-methano-cyclopenta[b]furan-2,6-dione
• 英文别名: 4-oxatricyclo[4.2.1.03,7]nonane-2,5-dione
• CAS: 16479-73-5
• 化学式: C₈H₈O₃
• 分子量: 152.15
• InChiKey: YIGWIQOEFIWCLA-UHFFFAOYSA-N

物化性质

• 沸点：
  371.5±25.0 °C(Predicted)
• 密度：
  1.438±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0.2
• 重原子数：
  11
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.75
• 拓扑面积：
  43.4
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• COMPOUND, RESIN AND PHOTORESIST COMPOSITION
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160244400A1

  公开（公告）日：2016-08-25

  A compound represented by formula (I): wherein R 1 represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group where a hydrogen atom can be replaced by a halogen atom, L 1 represents a C1-C8 fluorinated alkanediyl group, X 1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O— where * represents a binding site to L 1 , and R 2 represents a C1-C18 hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a hydroxy group, or in which two hydrogen atoms can be each replaced by an oxygen atom forming one ketal structure together with a C1-C8 alkanediyl group bonded to the oxygen atom and a hydrogen atom in said ketal structure can be replaced by a fluorine atom.

  化合物的化学式（I）表示如下： 其中，R1代表氢原子、卤素原子或C1-C6烷基，其中氢原子可以被卤素原子取代，L1代表C1-C8氟代烷二基基团，X1代表*—CO—O—、*—O—CO—、*—O—CO—O—或*—O—，其中*代表与L1结合位点，R2代表C1-C18烃基团，其中亚甲基基团可以被氧原子、羰基团或磺酰基团取代，其中氢原子可以被羟基取代，或其中两个氢原子可以分别被氧原子取代，与氧原子结合形成一个与氧原子结合的C1-C8烷二基基团一起形成一个缩醛结构，所述缩醛结构中的氢原子可以被氟原子取代。
• PHOTORESIST COMPOSITION
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20170168393A1

  公开（公告）日：2017-06-15

  A photoresist composition comprising: a resin which has a structural unit represented by formula (I): wherein R 1 represents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group which optionally has a halogen atom, and R 2 represents a C1 to C42 hydrocarbon group which optionally has a substituent; an alkali-soluble resin; an acid generator; and a solvent.
• RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210278765A1

  公开（公告）日：2021-09-09

  The present invention provides a resist composition which has sufficient resistant to a plating treatment and is capable of forming a resist pattern with high accuracy. The present invention also provides a method for producing a resist pattern using the resist composition, and a method for producing a plated molded article using the resist pattern. The present invention relates to a resist composition comprising a compound (I) having a quinone diazide sulfonyl group, a resin comprising a structural unit having an acid-labile group (A1), an alkali-soluble resin (A2) and an acid generator (B); a method for producing a resist pattern using the resist composition; and a method for producing a plated molded article using the resist pattern.
• US9671692B2
  申请人：——

  公开号：US9671692B2

  公开（公告）日：2017-06-06
• US9822060B2
  申请人：——

  公开号：US9822060B2

  公开（公告）日：2017-11-21