1-(4-hydroxy-2-iodo-phenyl)-ethanone | 89942-32-5

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-(4-hydroxy-2-iodo-phenyl)-ethanone
• 英文别名: 1-(4-Hydroxy-2-jod-phenyl)-aethanon；2-Iod-4-hydroxy-acetophenon；1-(4-Hydroxy-2-iodophenyl)ethan-1-one；1-(4-hydroxy-2-iodophenyl)ethanone
• CAS: 89942-32-5
• 化学式: C₈H₇IO₂
• 分子量: 262.047
• InChiKey: CUJXMENEPQIOCB-UHFFFAOYSA-N

物化性质

• 熔点：
  128–136°C
• 沸点：
  371.6±32.0 °C(Predicted)
• 密度：
  1.852±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.9
• 重原子数：
  11
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.12
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  2-iodo-4-methoxybenzoyl chloride 在 氢溴酸 、 溶剂黄146 作用下， 生成 1-(4-hydroxy-2-iodo-phenyl)-ethanone
  参考文献：
  名称：

  A Synthesis of 2'-Acetyl-5, 5', 6-trimethoxy-2-biphenylcarboxylic Acid

  摘要：

  与 Oki 的报告相反，3-碘苯甲醚与乙酰氯的 Friedel-Crafts 反应产生了四种产物，即 2'-羟基-4'-碘、2'-碘-4'-羟基、2'-碘-4'-甲氧基和 2'-甲氧基-4'-碘苯乙酮、2'-iodo-4'-methoxyacetophenone 与 2-bromoor2-iodo-veratrate 甲酯进行乌尔曼缩合，然后进行水解，得到了 2'-乙酰基-5,5'6-三甲氧基-2-联苯羧酸，收率很低。

  DOI：

  10.1248/cpb.10.1137

文献信息

• Chen; Chang, Taiwan Yaoxue Zazhi, 1952, vol. 4, p. 38
  作者：Chen、Chang

  DOI：——

  日期：——
• Kobayashi; Kuraishi, Chemical and pharmaceutical bulletin, 1962, vol. 10, p. 1137,1139
  作者：Kobayashi、Kuraishi

  DOI：——

  日期：——
• CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20210048747A1

  公开（公告）日：2021-02-18

  A chemically amplified resist composition comprising a quencher containing an ammonium salt of an iodized or brominated phenol and an acid generator exerts a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having satisfactory resolution, LWR and CDU.
• POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20210003917A1

  公开（公告）日：2021-01-07

  A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of an iodized or brominated phenol, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.
• RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20210080828A1

  公开（公告）日：2021-03-18

  A resist composition comprising a base polymer and a salt is provided. The salt consisting of an anion derived from an iodized or brominated phenol and a cation derived from a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene compound. The resist composition exerts a high sensitizing effect and an acid diffusion suppressing effect, causes no film thickness loss after development, and is improved in resolution, LWR and CDU when a pattern is formed therefrom by lithography.